{"title":"A Novel Optical Proximity Correction (OPC) System Based on Deep Learning Method for the Extreme Ultraviolet (EUV) Lithography","authors":"Li-Ye Xiao, Jun-Nan Yi, Yiqian Mao, Xin Qi, Ronghan Hong, Q. Liu","doi":"10.2528/pier22101601","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":90705,"journal":{"name":"Progress in Electromagnetics Research Symposium : [proceedings]. Progress in Electromagnetics Research Symposium","volume":"1 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Progress in Electromagnetics Research Symposium : [proceedings]. Progress in Electromagnetics Research Symposium","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.2528/pier22101601","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}