Preparation and Properties of LiTaO3 Thin Films by Dipping Method

T. Furusaki, G. Tei, K. Kodaira, S. Shimada, T. Matsushita
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引用次数: 6

Abstract

Transparent and smooth LiTaO3 thin films 1000nm thick were prepared at 600°-800°C on platinum and fused silica substrates by the dipping method. Uniform grains were distributed in the films, and the grain size increased with increasing temperatures. Dielectric properties of the film depended on the defects of the film such as crack or pinhole. The crack-free film prepared at 800°C showed a symmetric D-E hysteresis loop. The spontaneous polarization was 0.6μC/cm2, remanent polarization was 0.4μC/cm2 and coercive field was 60kV/cm. Dielectric constant and dielectric loss angle were about 50 and 0.05, respectively. The optical transmission of the films was about 40-80% and refractive index was 2.1 in the visible region.
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浸渍法制备LiTaO3薄膜及其性能
在600°-800°C的温度下,采用浸渍法在铂和熔融二氧化硅衬底上制备了厚度为1000nm的透明光滑LiTaO3薄膜。薄膜中晶粒分布均匀,晶粒尺寸随温度升高而增大。薄膜的介电性能取决于薄膜的缺陷,如裂纹或针孔。在800℃下制备的无裂纹薄膜呈现对称的D-E磁滞回线。自发极化为0.6μC/cm2,剩余极化为0.4μC/cm2,矫顽力为60kV/cm。介电常数约为50,介电损耗角约为0.05。薄膜的透光率约为40 ~ 80%,在可见光区折射率为2.1。
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