{"title":"Optimization of Technological Process to Increase Integration Rate of Field-Effect Heterotransistors in Thin Films Structures","authors":"E. Pankratov, E. Bulaeva","doi":"10.1166/JOM.2014.1070","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":38114,"journal":{"name":"International Journal of Mechatronics and Automation","volume":"129 1","pages":"291-300"},"PeriodicalIF":0.0000,"publicationDate":"2014-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Mechatronics and Automation","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1166/JOM.2014.1070","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q4","JCRName":"Engineering","Score":null,"Total":0}
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