A. Mironov, Sehyun Park, T. Reboli, Jinhong Kim, D. Sievers, Sung-Jin Park, J. Eden
{"title":"Eco-friendly 3D micromachining of polymers by 172 nm photoablation for optical and microfluidics applications","authors":"A. Mironov, Sehyun Park, T. Reboli, Jinhong Kim, D. Sievers, Sung-Jin Park, J. Eden","doi":"10.1117/12.2594868","DOIUrl":null,"url":null,"abstract":"We report a novel, environmentally-friendly, scalable subtractive process which allows for complex 3D optical, microfluidic and biomedical components and microstructures to be fabricated precisely in a wide variety of polymers. \nThe reported technique is capable of producing submicron structures with 20 µm depth in biodegradable polymers. The process is based on a VUV (λ=172 nm) photoablative lithographic technique utilizing flat microplasma lamps and does not require a clean room environment or any chemical processing. The fabricated 3D surface may also be used as a mold for PDMS curing.","PeriodicalId":23471,"journal":{"name":"UV and Higher Energy Photonics: From Materials to Applications 2021","volume":"109 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2021-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"UV and Higher Energy Photonics: From Materials to Applications 2021","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2594868","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We report a novel, environmentally-friendly, scalable subtractive process which allows for complex 3D optical, microfluidic and biomedical components and microstructures to be fabricated precisely in a wide variety of polymers.
The reported technique is capable of producing submicron structures with 20 µm depth in biodegradable polymers. The process is based on a VUV (λ=172 nm) photoablative lithographic technique utilizing flat microplasma lamps and does not require a clean room environment or any chemical processing. The fabricated 3D surface may also be used as a mold for PDMS curing.