Electrochemical deposition of copper on zinc and its alloys

B. Kuznetsov
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Abstract

A new electrolyte composition and deposition conditions of quality (light, densely packed, homogeneous) copper coatings on zinc and its alloys were found. It was established that the electrochemical deposition of copper is possible from an alkaline solution containing propylene glycol. It was shown that the adding of hydroxyethylidene diphosphonic acid in the solution stabilises the electrolyte during operation and storage. The addition of morpholine provided deposition of quality copper coatings on zinc and its alloys in a wide range of current densities.
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铜在锌及其合金上的电化学沉积
发现了一种新的电解质组成和锌及其合金表面高质量(轻质、致密、均匀)铜镀层的沉积条件。在含丙二醇的碱性溶液中电化学沉积铜是可能的。结果表明,在电解液中加入羟乙基二膦酸能使电解液在操作和贮存过程中保持稳定。在很大的电流密度范围内,加入啉可以在锌及其合金表面沉积高质量的铜镀层。
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