{"title":"Effect of RF power on structure and optical properties of RF sputtered copper oxide thin films","authors":"J. Kaur, S. Saipriya, R. Singh","doi":"10.1063/1.4917927","DOIUrl":null,"url":null,"abstract":"Copper oxide films were fabricated using RF-magnetron sputtering from CuO target in an argon environment at various RF powers. The effect of RF power on structure, morphology and optical properties of the films was studied. As deposited films were Cu4O3. The GIXRD and Raman spectra show the evolution of CuO phase with increasing RF power. The optical band gap decreases from 2.1 to 1.6 eV with increase in RF power.","PeriodicalId":16850,"journal":{"name":"Journal of Physics C: Solid State Physics","volume":"31 1","pages":"080023"},"PeriodicalIF":0.0000,"publicationDate":"2015-06-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of Physics C: Solid State Physics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/1.4917927","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3
Abstract
Copper oxide films were fabricated using RF-magnetron sputtering from CuO target in an argon environment at various RF powers. The effect of RF power on structure, morphology and optical properties of the films was studied. As deposited films were Cu4O3. The GIXRD and Raman spectra show the evolution of CuO phase with increasing RF power. The optical band gap decreases from 2.1 to 1.6 eV with increase in RF power.
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