L. Alberts, M. Kaiser, C. Hunyar, M. Graf, K. Nauenburg, E. Rauchle
{"title":"Application of a MASWP: Duo_Plasmaline next generation","authors":"L. Alberts, M. Kaiser, C. Hunyar, M. Graf, K. Nauenburg, E. Rauchle","doi":"10.1109/PLASMA.2008.4590673","DOIUrl":null,"url":null,"abstract":"Summary form only given. Microwave based surface wave plasma reactors like those relying on the Duo-Plasmaline encounters large success in dielectric coating applications. But they show principal limitation to dielectric materials applications. We attempt here to present a Duo-Plasmaline NG based on the metal antenna SWP. This design would circumvent the dielectric coating limitation. The propagation length of the plasma will be reported as a function of gas pressure, microwave power and bias potential for different atmospheres like argon, nitrogen and oxygen. The plasma homogeneity will be reflected in the coating thickness evolution of a PECVD thin film along the antenna.","PeriodicalId":6359,"journal":{"name":"2008 IEEE 35th International Conference on Plasma Science","volume":"11 1","pages":"1-1"},"PeriodicalIF":0.0000,"publicationDate":"2008-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE 35th International Conference on Plasma Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PLASMA.2008.4590673","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
Summary form only given. Microwave based surface wave plasma reactors like those relying on the Duo-Plasmaline encounters large success in dielectric coating applications. But they show principal limitation to dielectric materials applications. We attempt here to present a Duo-Plasmaline NG based on the metal antenna SWP. This design would circumvent the dielectric coating limitation. The propagation length of the plasma will be reported as a function of gas pressure, microwave power and bias potential for different atmospheres like argon, nitrogen and oxygen. The plasma homogeneity will be reflected in the coating thickness evolution of a PECVD thin film along the antenna.
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