Effects of electron irradiation on photoluminescence from 1-eV GaInNAs epilayers subject to thermal annealing

E. Pavelescu, R. Kudrawiec, N. Bǎlţǎţeanu, S. Spânulescu, M. Guina
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Abstract

We have investigated the influence of 7-MeV electron irradiation to the dose of 1.8×1016 cm-2 and subsequent rapid thermal annealing on luminescence performance of lattice-matched 1-eV GaInNAs-on-GaAs epilayers, grown by molecular beam epitaxy. The study has been done by means of 9-K photoluminescence (PL) in conjunction with 300-K photoreflectance (PR) spectroscopy and x-ray diffraction measurements. A drastic deterioration in PL has been seen upon the electron irradiation. When rapid thermally annealed at 800 oC for 1 min an enhancement in PL has been observed as compared to the reference non-irradiated sample. The irradiation-promoted enhancement in PL upon annealing has been accompanied by a small additional blue shift (BS) of the PL. This additional annealing-induced BS has been found to be mainly due to an irradiation-promoted enhancement in In-N bonds formation.
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电子辐照对热退火后1 ev GaInNAs薄膜光致发光的影响
我们研究了7-MeV电子辐照对1.8×1016 cm-2剂量和随后的快速热退火对分子束外延生长的晶格匹配1-eV gaas -on- gaas涂层发光性能的影响。该研究是通过9-K光致发光(PL)结合300-K光反射(PR)光谱和x射线衍射测量来完成的。在电子辐照下,PL急剧恶化。当在800℃快速热退火1分钟时,与参考未辐照样品相比,观察到PL的增强。退火后辐照促进的PL增强伴随着PL的一个小的额外蓝移(BS)。这种额外的退火诱导的BS已被发现主要是由于辐照促进的in - n键形成的增强。
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