{"title":"Development of elastic polishing materials for the process of chemical-mechanical planarization","authors":"D. I. Terashkevich, E. S. Bokova, G. Kovalenko","doi":"10.35164/0554-2901-2023-3-4-44-48","DOIUrl":null,"url":null,"abstract":"The paper presents the results of the development of conditions for the production of elastic polishing materials based on solutions of polyethyruretanes, for the chemical-mechanical planarization of semiconductor silicon wafers.","PeriodicalId":20254,"journal":{"name":"Plasticheskie massy","volume":"34 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2023-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Plasticheskie massy","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.35164/0554-2901-2023-3-4-44-48","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
The paper presents the results of the development of conditions for the production of elastic polishing materials based on solutions of polyethyruretanes, for the chemical-mechanical planarization of semiconductor silicon wafers.
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