C. Pflügl, S. Golka, M. Austerer, W. Schrenk, A. Andrews, G. Strasser
{"title":"Surface emitting quantum cascade lasers","authors":"C. Pflügl, S. Golka, M. Austerer, W. Schrenk, A. Andrews, G. Strasser","doi":"10.1109/ICIMW.2004.1422001","DOIUrl":null,"url":null,"abstract":"We present single mode surface emitting quantum cascade lasers (QCLs). Efficient surface emission of QCLs is obtained by a second-order surface grating. More complicated structures, e.g. photonic crystals, require very high aspect ratio dry etching. We provide a short overview of chlorine based plasma etching and discuss the limitations on accuracy and the impact of different process parameters on etch profiles and depths.","PeriodicalId":13627,"journal":{"name":"Infrared and Millimeter Waves, Conference Digest of the 2004 Joint 29th International Conference on 2004 and 12th International Conference on Terahertz Electronics, 2004.","volume":"25 1","pages":"157-158"},"PeriodicalIF":0.0000,"publicationDate":"2004-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Infrared and Millimeter Waves, Conference Digest of the 2004 Joint 29th International Conference on 2004 and 12th International Conference on Terahertz Electronics, 2004.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIMW.2004.1422001","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
We present single mode surface emitting quantum cascade lasers (QCLs). Efficient surface emission of QCLs is obtained by a second-order surface grating. More complicated structures, e.g. photonic crystals, require very high aspect ratio dry etching. We provide a short overview of chlorine based plasma etching and discuss the limitations on accuracy and the impact of different process parameters on etch profiles and depths.
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