ON MECHANISMS OF OXYGEN INFLUENCE ON GAS-PHASE PARAMETERS AND SILICON REACTIVE-ION ETCHING KINETICS IN HBr + Cl2 + O2 PLASMA

Abstract

The effects of both HBr/O2 and Cl2/O2 mixing ratios in HBr+Cl2+O2 gas mixture on plasma parameters, steady-state densities of active species and Si etching kinetics were studied under the typical conditions of reactive ion etching process: total gas pressure (p = 10 mTorr), input power (W = 500 W), bias power (Wdc = 200 W). The data on internal plasma parameters and plasma chemistry were obtained using a combination of Langmuir probe diagnostics and 0-dimensional (global) plasma modeling. It was found that the variation in HBr/O2 mixing ratio at constant Cl2 fraction in a feed gas is characterized by the stronger impact on the steady-state plasma composition through both electron-impact and atom-molecular reaction kinetics as well as allows one to obtain the wider change in the total halogen atom density. It was shown that changes in both HBr/O2 and Cl2/O2 mixing ratios toward O2-rich plasmas lowers the Si etching rate that exhibits no evident correlations with total halogen atom flux and ion energy flux. The model-based analysis of Si etching kinetics allowed one to conclude that the effective reaction probability for Si + Cl/Br heterogeneous reaction depends on the flux of oxidative species – oxygen atoms and OH radicals. The reasons may be 1) the oxidation of silicon resulting in higher reaction threshold energy; and 2) the decreasing fraction of free adsorption sites for Cl/Br atoms due to the oxidation of reaction products into the lower volatile SiBrxOy and SiClxOy compounds.