Frequency-scalable SiGe bipolar RFIC front-end design

O. Shana'a, I. Linscott, L. Tyler
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引用次数: 107

Abstract

A highly-optimized SiGe RF bipolar front-end design is proposed. The optimum noise figure (NF/sub opt/) of a bipolar device is introduced in contrast with the minimum noise figure (NF/sub min/). An analytical method to design the low noise amplifier (LNA) at the optimum noise figure point is derived. The optimized LNA design scales linearly with frequency for multi-band RF front-end design. The optimization method is extended to the design of an improved Gilbert cell active mixer. The technique was demonstrated on a 1800 MHz SiGe bipolar RF front-end whose LNA achieves a 1.3 dB NF at a bias current of 4.5 mA while the mixer achieves a single-sideband noise figure (SSB NF) of 6.5 dB at only 4.8 mA.
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频率可扩展SiGe双极RFIC前端设计
提出了一种高度优化的SiGe射频双极前端设计方案。介绍了双极器件的最佳噪声系数(NF/sub opt/)与最小噪声系数(NF/sub min/)的对比。导出了在最佳噪声系数点处设计低噪声放大器的解析方法。优化后的LNA设计与频率呈线性关系,适用于多频段射频前端设计。将该优化方法推广到改进的吉尔伯特单元有源混频器的设计中。该技术在1800 MHz SiGe双极射频前端上进行了演示,其LNA在4.5 mA偏置电流下达到1.3 dB NF,而混频器在仅4.8 mA时达到6.5 dB的单边带噪声系数(SSB NF)。
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