Microstructured ZnO coatings for improved performance in Cu(In,Ga)Se2 photovoltaic devices

J. Frantz, J. Myers, R. Bekele, J. Sanghera
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引用次数: 2

Abstract

The performance of thin film Cu(In,Ga)Se2 (CIGS) photovoltaics is typically degraded by light lost due to the high reflectivity of the transparent top contact and by recombination resulting from carrier generation far from the junction. Traditional antireflective (AR) coatings are insufficient to address the former issue, particularly at non-normal incidence. We present a novel microstructured ZnO coating that serves two functions; it acts an AR layer with superior non-normal performance in comparison to thin film AR coatings, and it scatters a significant fraction of the incoming radiation at a large angle, resulting in absorption that is on average closer to the junction. This coating, formed via a wet etch process, results in performance comparable to that of uncoated films at normal incidence and an increase of up to 25% in the short circuit current and 18% in device efficiency at non-normal incidence.
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改善Cu(in,Ga)Se2光电器件性能的微结构ZnO涂层
薄膜Cu(In,Ga)Se2 (CIGS)光伏电池的性能通常会因透明顶部接触的高反射率造成的光损失和远离结的载流子产生导致的复合而下降。传统的抗反射(AR)涂层不足以解决前一个问题,特别是在非正常入射下。我们提出了一种具有两种功能的新型微结构ZnO涂层;与薄膜AR涂层相比,它作为一种具有优越非正常性能的AR层,并且它以大角度散射入射辐射的很大一部分,从而导致平均更接近结的吸收。这种涂层是通过湿式蚀刻工艺形成的,在正常入射下,其性能与未涂层薄膜相当,在非正常入射下,短路电流可提高25%,器件效率可提高18%。
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