Unsteady MHD Thin Film Flow of a Second-Grade Fluid past a Tilted Plate under the Impact of Thermal Radiation and Chemical Reaction

M. Endalew, Masitawal Demsie Goshu, Yimer Chekol Tegegne
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Abstract

This paper explores the impact of chemical reaction and thermal radiation on time-dependent hydromagnetic thin-film flow of a second-grade fluid across an inclined flat plate embedded in a porous medium. The thermal radiation based on the Rosseland approximation is incorporated in the energy equation. Uniform applied magnetic field and first-order homogenous chemical reaction are included in the momentum and concentration equations, respectively. The novel mathematical flow model is constructed by using a set of partial differential equations (PDEs). The PDEs are then transformed into an equivalent set of ordinary differential equations (ODEs) and solved by applying the Laplace transform method. However, the time domain solutions are obtained by using the INVLAP subroutine of MATLAB. Physical parameters influencing thin-film velocity, temperature, and concentration are illustrated graphically, while those affecting skin friction, heat, and mass transfer rates are presented in a tabular form. It is found that thin-film velocity and temperature boost with increasing values of thermal radiation, but thin-film velocity decreases with increasing values of chemical reaction and magnetic field. The current investigation is to enhance heat and mass transfer in the design of mechanical systems involving the thin film flow of second-grade fluids over an inclined flat plate after applying thermal radiation and chemical reaction.
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热辐射和化学反应作用下二阶流体通过倾斜板的非定常MHD薄膜流动
本文探讨了化学反应和热辐射对二级流体在多孔介质中斜平板上随时间变化的磁薄膜流动的影响。基于Rosseland近似的热辐射被纳入能量方程。动量方程和浓度方程分别包含均匀外加磁场和一阶均相化学反应。利用一组偏微分方程(PDEs)建立了新的数学流模型。然后将偏微分方程转化为一组等价的常微分方程,并应用拉普拉斯变换方法求解。然而,时域解是利用MATLAB的INVLAP子程序得到的。影响薄膜速度、温度和浓度的物理参数用图表表示,而影响表面摩擦、热和传质速率的物理参数用表格表示。发现薄膜速度和温度随热辐射的增大而增大,而随化学反应和磁场的增大而减小。目前的研究是在设计涉及二级流体薄膜在施加热辐射和化学反应后在倾斜平板上流动的机械系统时加强传热和传质。
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