Deposition of tin oxide thin film by sol-gel dip coating technique and its characterization

B. R. Aswathy, K. Vinay, M. Arjun, P. Manoj
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引用次数: 4

Abstract

Tin oxide (Sn3O4) thin films were deposited on glass substrate using inorganic precursor by sol gel dip coating technique. The structural studies of the films were obtained by X-ray diffraction technique and the data showed that the synthesized tin oxide films have triclinic structure with preferred orientation along (-2, 1, 0) and (-4, 2,0) plane. Optical studies revealed that the film having more thickness shows better transmission about 92% in the visible region and optical band gap energy increases to 2.93eV due to Moss-Burstein effect. The presence of tin and oxygen in the samples were confirmed with characteristic vibrational mode of Sn–O in the region 430–482 cm−1 and 669-674 cm−1 using FTIR spectroscopy. Photoluminescence spectra shows the presence of emission in the visible region depends on thickness of the film. This study suggests that the sol-gel dip coating method is the best method for fabricating highly pure, transparent and homogenous mixed valence phase of tin oxide thin film and further studies may be required to tailor electrical and optical properties of the films suitable for various optoelectronic applications.Tin oxide (Sn3O4) thin films were deposited on glass substrate using inorganic precursor by sol gel dip coating technique. The structural studies of the films were obtained by X-ray diffraction technique and the data showed that the synthesized tin oxide films have triclinic structure with preferred orientation along (-2, 1, 0) and (-4, 2,0) plane. Optical studies revealed that the film having more thickness shows better transmission about 92% in the visible region and optical band gap energy increases to 2.93eV due to Moss-Burstein effect. The presence of tin and oxygen in the samples were confirmed with characteristic vibrational mode of Sn–O in the region 430–482 cm−1 and 669-674 cm−1 using FTIR spectroscopy. Photoluminescence spectra shows the presence of emission in the visible region depends on thickness of the film. This study suggests that the sol-gel dip coating method is the best method for fabricating highly pure, transparent and homogenous mixed valence phase of tin oxide thin film and further...
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溶胶-凝胶浸涂法制备氧化锡薄膜及其表征
采用溶胶-凝胶浸涂技术,采用无机前驱体在玻璃基板上沉积氧化锡(Sn3O4)薄膜。利用x射线衍射技术对膜的结构进行了研究,结果表明,合成的氧化锡膜具有沿(- 2,1,0)和(- 4,2,0)平面优先取向的三斜结构。光学研究表明,薄膜厚度越大,在可见光区域的透射率越高,约为92%,并且由于Moss-Burstein效应,光学带隙能量增加到2.93eV。在430 ~ 482 cm−1和669 ~ 674 cm−1区域Sn-O的特征振动模式证实了样品中锡和氧的存在。光致发光光谱显示可见光区域的发射取决于薄膜的厚度。该研究表明,溶胶-凝胶浸渍法是制备高纯度、透明、均匀的混合价相氧化锡薄膜的最佳方法,需要进一步研究以适应各种光电应用的薄膜的电学和光学性能。采用溶胶-凝胶浸涂技术,采用无机前驱体在玻璃基板上沉积氧化锡(Sn3O4)薄膜。利用x射线衍射技术对膜的结构进行了研究,结果表明,合成的氧化锡膜具有沿(- 2,1,0)和(- 4,2,0)平面优先取向的三斜结构。光学研究表明,薄膜厚度越大,在可见光区域的透射率越高,约为92%,并且由于Moss-Burstein效应,光学带隙能量增加到2.93eV。在430 ~ 482 cm−1和669 ~ 674 cm−1区域Sn-O的特征振动模式证实了样品中锡和氧的存在。光致发光光谱显示可见光区域的发射取决于薄膜的厚度。研究表明,溶胶-凝胶浸渍法是制备高纯度、透明、均匀的混合价相氧化锡薄膜的最佳方法。
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