Laser-Based Fabrication of Micromechanical Diaphragms for Pressure Sensing using Bragg Gratings

Alexander Jantzen, P. Gow, S. L. Scholl, L. J. Boyd, Peter G. R. Smith, C. Holmes
{"title":"Laser-Based Fabrication of Micromechanical Diaphragms for Pressure Sensing using Bragg Gratings","authors":"Alexander Jantzen, P. Gow, S. L. Scholl, L. J. Boyd, Peter G. R. Smith, C. Holmes","doi":"10.1109/CLEOE-EQEC.2019.8871445","DOIUrl":null,"url":null,"abstract":"Micromechanical devices are typically fabricated in expensive cleanrooms using techniques that are not conducive towards rapid and varied prototyping. This is typically because photolithography remains the main method for patterning of layers and should a small change be desired in the design, a new mask would have to be made, which is both a costly and slow process. This work reports a laser based approach for micromechanical diaphragm fabrication. The technique uses rapid thermal heating and subsequent quenching to a pattern a hard thermal oxide layer on a silicon substrate. This method used a computer controlled 9.3 micrometre wavelength CO2 laser beam to spot mark areas that were subsequently wet etched. This approach was found to be extremely repeatable and gave good consistency. It does not require cleanroom processing and is significantly more cost and time effective. Diaphragm feature size was observed to have a variability of <1% for diaphragms of several millimetres in size.","PeriodicalId":6714,"journal":{"name":"2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)","volume":"112 1","pages":"1-1"},"PeriodicalIF":0.0000,"publicationDate":"2019-06-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CLEOE-EQEC.2019.8871445","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

Abstract

Micromechanical devices are typically fabricated in expensive cleanrooms using techniques that are not conducive towards rapid and varied prototyping. This is typically because photolithography remains the main method for patterning of layers and should a small change be desired in the design, a new mask would have to be made, which is both a costly and slow process. This work reports a laser based approach for micromechanical diaphragm fabrication. The technique uses rapid thermal heating and subsequent quenching to a pattern a hard thermal oxide layer on a silicon substrate. This method used a computer controlled 9.3 micrometre wavelength CO2 laser beam to spot mark areas that were subsequently wet etched. This approach was found to be extremely repeatable and gave good consistency. It does not require cleanroom processing and is significantly more cost and time effective. Diaphragm feature size was observed to have a variability of <1% for diaphragms of several millimetres in size.
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基于Bragg光栅的压力传感微机械膜片的激光制备
微机械设备通常是在昂贵的洁净室中制造的,使用的技术不利于快速和多样化的原型。这通常是因为光刻仍然是层图案的主要方法,如果在设计中需要微小的改变,就必须制作新的掩模,这是一个既昂贵又缓慢的过程。这项工作报告了一种基于激光的微机械隔膜制造方法。该技术使用快速热加热和随后的淬火来在硅衬底上形成硬热氧化层的图案。该方法使用计算机控制的9.3微米波长的CO2激光束来标记随后湿蚀刻的区域。这种方法被发现是非常可重复的,并提供了良好的一致性。它不需要无尘室处理,并且具有显著的成本和时间效益。观察到膜片特征尺寸对于几毫米尺寸的膜片具有<1%的可变性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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