Thermochromic VO2 thin films: Growth and characterization

Abstract

Thin films of thermochromic VO2 were stabilized on Si substrate at different deposition parameters by sputtering method and their structural characterization was carried out using X-ray diffraction technique. Sputtering in Ar/O2 gas mixture has resulted in mixed phase growth of VO2. On the other hand, sputtering with Aronly has resulted in single phase growth of VO2 thin films. Monoclinic to rutile structural phase transition was studied in the grown VO2 thin film samples by performing the temperature dependent grazing incidence X-ray diffraction (GIXRD) measurements.