T. Fukushima, Y. Ohara, J. Bea, M. Murugesan, K. Lee, T. Tanaka, M. Koyanagi
{"title":"Non-conductive film and compression molding technology for self-assembly-based 3D integration","authors":"T. Fukushima, Y. Ohara, J. Bea, M. Murugesan, K. Lee, T. Tanaka, M. Koyanagi","doi":"10.1109/ECTC.2012.6248860","DOIUrl":null,"url":null,"abstract":"Two key technologies consisting of chip-to-wafer bonding through a non-conductive film (NCF) and wafer-level packaging using compression molding were studied for self-assembly-based 3D integration, especially reconfigured wafer-to-wafer stacking. 4-mm-by-5-mm chips having 20-μm-pitch Cu-SnAg microbumps were successfully bonded to wafers through NCF. The resulting daisy chain obtained from the chip-to-wafer structure showed low contact resistance of approximately 50 MΩ/bump. Compression molding was implemented to a chip-on-wafer structure. Grinding of the chip-on-wafer structure gave low total thickness variation (TTV) within 1 μm and the following CMP led good planarization capability.","PeriodicalId":6384,"journal":{"name":"2012 IEEE 62nd Electronic Components and Technology Conference","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2012-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE 62nd Electronic Components and Technology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2012.6248860","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
Abstract
Two key technologies consisting of chip-to-wafer bonding through a non-conductive film (NCF) and wafer-level packaging using compression molding were studied for self-assembly-based 3D integration, especially reconfigured wafer-to-wafer stacking. 4-mm-by-5-mm chips having 20-μm-pitch Cu-SnAg microbumps were successfully bonded to wafers through NCF. The resulting daisy chain obtained from the chip-to-wafer structure showed low contact resistance of approximately 50 MΩ/bump. Compression molding was implemented to a chip-on-wafer structure. Grinding of the chip-on-wafer structure gave low total thickness variation (TTV) within 1 μm and the following CMP led good planarization capability.