Non-conductive film and compression molding technology for self-assembly-based 3D integration

{"title":"Non-conductive film and compression molding technology for self-assembly-based 3D integration","authors":"T. Fukushima, Y. Ohara, J. Bea, M. Murugesan, K. Lee, T. Tanaka, M. Koyanagi","doi":"10.1109/ECTC.2012.6248860","DOIUrl":null,"url":null,"abstract":"Two key technologies consisting of chip-to-wafer bonding through a non-conductive film (NCF) and wafer-level packaging using compression molding were studied for self-assembly-based 3D integration, especially reconfigured wafer-to-wafer stacking. 4-mm-by-5-mm chips having 20-μm-pitch Cu-SnAg microbumps were successfully bonded to wafers through NCF. The resulting daisy chain obtained from the chip-to-wafer structure showed low contact resistance of approximately 50 MΩ/bump. Compression molding was implemented to a chip-on-wafer structure. Grinding of the chip-on-wafer structure gave low total thickness variation (TTV) within 1 μm and the following CMP led good planarization capability.","PeriodicalId":6384,"journal":{"name":"2012 IEEE 62nd Electronic Components and Technology Conference","volume":"101 1","pages":"393-398"},"PeriodicalIF":0.0000,"publicationDate":"2012-07-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 IEEE 62nd Electronic Components and Technology Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ECTC.2012.6248860","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12

Abstract

Two key technologies consisting of chip-to-wafer bonding through a non-conductive film (NCF) and wafer-level packaging using compression molding were studied for self-assembly-based 3D integration, especially reconfigured wafer-to-wafer stacking. 4-mm-by-5-mm chips having 20-μm-pitch Cu-SnAg microbumps were successfully bonded to wafers through NCF. The resulting daisy chain obtained from the chip-to-wafer structure showed low contact resistance of approximately 50 MΩ/bump. Compression molding was implemented to a chip-on-wafer structure. Grinding of the chip-on-wafer structure gave low total thickness variation (TTV) within 1 μm and the following CMP led good planarization capability.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
基于自组装的三维集成的非导电薄膜和压缩成型技术
研究了基于自组装的三维集成的两个关键技术,即通过非导电薄膜(NCF)的晶片键合和使用压缩成型的晶片级封装,特别是重新配置的晶片到晶片堆叠。具有20 μm间距Cu-SnAg微凸起的4 mm × 5 mm芯片通过NCF成功结合到晶圆上。从芯片到晶圆结构得到的菊花链显示出约50 MΩ/bump的低接触电阻。对片上芯片结构进行了压缩成型。对片上晶片结构进行磨削后,总厚度变化(TTV)在1 μm以内,磨削后的CMP具有良好的平面化能力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
相关文献
Self-Assembly Study to Precisely Align Dies Having Microbump Covered with Non-Conductive Film for Advanced Chip-to-Wafer 3D Integration
IF 0 The Japan Society of Applied PhysicsPub Date : 2013-09-25 DOI: 10.7567/SSDM.2013.K-1-6
Yuka Ito, T. Fukushima, Kang-wook Lee, K. Choki, Tetsu Tanaka, M. Koyanagi
High density and reliable packaging technology with Non Conductive Film for 3D/TSV
IF 0 2013 IEEE International 3D Systems Integration Conference (3DIC)Pub Date : 2013-10-01 DOI: 10.1109/3DIC.2013.6702322
K. Mori, Yoshihiro Ono, Shinji Watanabe, Toshikazu Ishikawa, Michiaki Sugiyama, S. Imasu, T. Ochiai, Ryo Mori, Tsuyoshi Kida, Tomoaki Hashimoto, Hideki Tanaka, M. Kimura
Plasma assisted multichip-to-wafer direct bonding technology for self-assembly based 3D integration
IF 0 2015 IEEE 65th Electronic Components and Technology Conference (ECTC)Pub Date : 2015-05-26 DOI: 10.1109/ECTC.2015.7159789
H. Hashiguchi, H. Yonekura, T. Fukushima, M. Murugesan, H. Kino, K. Lee, T. Tanaka, M. Koyanagi
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Parasitic electrical and electromagnetic effects Heat management Passive electronic components Interconnection technology Reliability and maintainability
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1