Productivity optimization techniques for the proactive semiconductor manufacturer

D. Maynard
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Abstract

Summary form only given. The experienced semiconductor manufacturer is often confronted by apparently similar products that yield drastically different productivities. The same processes are used to fabricate these chips, yet the manufacturer's costs are clearly different. The customers expect similar pricing and a deviation must be accompanied by a credible explanation. Design for manufacturability (DFM) has become a popular industry term, yet many chip designers are uncertain where to start and what to implement. The semiconductor manufacturer possesses knowledge or suspicions of potential barriers and improvement opportunities. This information must be proactively fed forward to the design shops, which must also budget resources and time to address these items. This presentation describes how this process works, illustrated with examples from IBM Microelectronics' Vermont facility. Before focusing on productivity optimization, a recommended set of metrics is identified, and the concept of physical design characterization is overviewed. Past and existing designs provide excellent historical insight into a large number of issues that are often independent of technology node. While robust technology development objectives strive to minimize the potential manufacturing stumbling blocks, competitive pressures will balance these with other constraints. Ultimately, it is decisions made by a designer that will determine the level of productivity achievable. Much of this presentation is devoted to describing a number of these decisions. In addition, the manufacturer may deploy complex algorithms to adjust the design to process constraints. Another, but more costly solution is for the manufacturer to tailor the process to a specific product, compensating for identified product-technology gaps. Lastly, this presentation ties these concepts together into a recommended business process.
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主动半导体制造商的生产率优化技术
只提供摘要形式。经验丰富的半导体制造商经常会遇到表面上相似的产品,但生产率却大不相同。制造这些芯片的工艺相同,但制造商的成本却明显不同。客户期望类似的定价,如果出现偏差,必须给出可信的解释。可制造性设计(DFM)已经成为一个流行的行业术语,但许多芯片设计人员不确定从哪里开始以及如何实现。半导体制造商了解或怀疑潜在的障碍和改进机会。这些信息必须主动提供给设计室,设计室还必须预算资源和时间来解决这些问题。这个演讲描述了这个过程是如何工作的,用IBM微电子佛蒙特工厂的例子来说明。在关注生产力优化之前,确定了一组推荐的度量标准,并概述了物理设计特征的概念。过去和现有的设计为通常独立于技术节点的大量问题提供了出色的历史洞察力。虽然强大的技术开发目标力求最大限度地减少潜在的制造障碍,但竞争压力将与其他限制相平衡。最终,是设计师做出的决定决定了可实现的生产力水平。这次演讲的大部分内容都是在描述这些决定。此外,制造商可能会部署复杂的算法来调整设计以适应工艺约束。另一种成本更高的解决方案是,制造商为特定产品量身定制流程,以弥补已确定的产品技术差距。最后,本文将这些概念结合到一个推荐的业务流程中。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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