{"title":"Widely tunable high-Q evanescent-mode resonators using flexible polymer substrates","authors":"S. Hajela, X. Gong, W. Chappell","doi":"10.1109/MWSYM.2005.1517172","DOIUrl":null,"url":null,"abstract":"Widely tunable high-Q evanescent-mode resonators are created using layer-by-layer polymer stereolithography process. The ability of polymer stereolithography process to fabricate thin flexible 3D structures with small fabrication tolerances enables the realization of highly loaded tunable evanescent-mode resonators. A tunable frequency range of 5.4-10.9 GHz, which corresponds to an equivalent capacitance tunability of 400%, is obtained with quality factors ranging from 745 to 1,580 over the tunable frequency range.","PeriodicalId":13133,"journal":{"name":"IEEE MTT-S International Microwave Symposium Digest, 2005.","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2005-06-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"12","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE MTT-S International Microwave Symposium Digest, 2005.","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/MWSYM.2005.1517172","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 12
Abstract
Widely tunable high-Q evanescent-mode resonators are created using layer-by-layer polymer stereolithography process. The ability of polymer stereolithography process to fabricate thin flexible 3D structures with small fabrication tolerances enables the realization of highly loaded tunable evanescent-mode resonators. A tunable frequency range of 5.4-10.9 GHz, which corresponds to an equivalent capacitance tunability of 400%, is obtained with quality factors ranging from 745 to 1,580 over the tunable frequency range.