Growths of MgB2 thin films by pulsed laser deposition

M. Ionescu, J. McKinnon, C. Cai, A. Li, K. Konstantinov, A.V. Pan, S.X. Dou
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引用次数: 3

Abstract

The recent discovery of metallic-like superconductivity in bulk MgB2 material [1] opened a new class of possible applications in current transport, magnetic field devices and electronic devices. Fabrication of thin films in situ is essential in order to explore the device applications of this material, and in spite of a few reports [2], [3], [4], this still remains a challenge. The main reasons for this are the high vapour pressure of Mg even at low temperatures, and the high susceptibility of Mg to oxidation. A number of c-axis oriented MgB2 films were grown on Al2O3-R cut, and the stoichiometry of the films was measured by ICP as a function of deposition pressure and laser fluence. It was found that the relative concentration of Mg on the substrate varies considerably with pressure and laser fluence. A relative concentration of around 53 at% Mg, which is necessary in order to form stoichiometric MgB2 phase, can be obtain only in a narrow range of deposition pressures and laser fluences. The films obtain under these conditions were characterised by X-ray diffraction and magnetic moment in applied fields up to 9T.

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脉冲激光沉积法制备MgB2薄膜
最近在块状MgB2材料中发现的类金属超导性[1]在电流传输、磁场器件和电子器件中开辟了一类新的可能应用。为了探索这种材料的器件应用,原位制备薄膜是必不可少的,尽管有一些报道[2],[3],[4],但这仍然是一个挑战。造成这一现象的主要原因是,即使在低温下,Mg的蒸气压也很高,而且Mg对氧化的敏感性很高。在Al2O3-R切割上生长了许多c轴取向的MgB2薄膜,并用ICP测量了薄膜的化学计量学,并将其作为沉积压力和激光通量的函数。结果表明,在激光辐照下,Mg在基体上的相对浓度随压力和激光辐照强度的变化有较大的变化。在% Mg时,形成化学计量MgB2相所必需的相对浓度约为53,但只能在很窄的沉积压力和激光影响范围内获得。在这些条件下得到的薄膜在高达9T的磁场下用x射线衍射和磁矩进行了表征。
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