{"title":"Electromigration-dependent parametric yield estimation","authors":"R. Barsky, I. Wagner","doi":"10.1109/ICECS.2004.1399629","DOIUrl":null,"url":null,"abstract":"We define and investigate the problem of electromigration faults caused by spot defects during the VLSI manufacturing process. Analysis is given for a simple layout, and simulations are presented and discussed for a more complicated case. It is shown that in some cases, electromigration-dependent parametric faults can make a significant contribution to the total yield estimation.","PeriodicalId":38467,"journal":{"name":"Giornale di Storia Costituzionale","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2004-12-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"11","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Giornale di Storia Costituzionale","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICECS.2004.1399629","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"Arts and Humanities","Score":null,"Total":0}
引用次数: 11
Abstract
We define and investigate the problem of electromigration faults caused by spot defects during the VLSI manufacturing process. Analysis is given for a simple layout, and simulations are presented and discussed for a more complicated case. It is shown that in some cases, electromigration-dependent parametric faults can make a significant contribution to the total yield estimation.
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