Plasma Dicing Fully Integrated Process-Flows Suitable for BEOL Advanced Packaging Fabrications

F. Wei, T. Tabuchi, T. Lazerand, Christopher Johnston, K. Mackenzie, M. Notarianni
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引用次数: 3

Abstract

Comprehensive investigations were conducted on identifying integration efforts needed to adapt plasma dicing technology in BEOL pre-production environments. First, the authors identified the suitable process flows. Within the process flow, laser grooving before plasma dicing was shown to be a key unit process to control resulting die sidewall quality. Significant improvement on laser grooving quality has been demonstrated. Through these efforts, extremely narrow kerfs and near ideal dies strengths were achieved on bare Si dies. Plasma dicing process generates fluorinated polymer residues on both Si die sidewalls and under the topography overhangs on wafer surfaces, such as under the solder balls or microbumps. Certain areas cannot be cleaned by in-chamber post-treatments. Multiple cleaning methods demonstrated process capability and compatibility to singulated dies-on-tape handling. Lastly, although many methods exist commercially for backmetal and DAF separations, the authors' investigation is still inconclusive on one preferred process for post-plasma dicing die separations.
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等离子切割完全集成的工艺流程,适合BEOL先进的封装制造
为了确定在BEOL预生产环境中适应等离子切割技术所需的集成工作,进行了全面的调查。首先,作者确定了合适的流程流。在工艺流程中,等离子切割前的激光开槽是控制模具侧壁质量的关键工序。激光开槽质量得到了显著改善。通过这些努力,在裸硅模上实现了极窄的切口和接近理想的模具强度。等离子切割过程会在硅模侧壁和晶圆片表面的地形悬垂下(如焊料球或微凸起下)产生含氟聚合物残留物。某些区域无法通过室内后处理进行清洁。多种清洁方法展示了处理能力和兼容性,以单一的磁带上处理。最后,尽管有许多商业上的方法用于金属背景和DAF分离,但作者的研究仍然没有确定一种首选的等离子体后切割模具分离方法。
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