{"title":"Degradation Kinetics in Cu0.1Ni0.1Co1.6Mn1.2O4-based ceramic materials","authors":"H. Klym, I. Karbovnyk, D. Lukashevych, Y. Kostiv","doi":"10.1109/UkrMiCo47782.2019.9165493","DOIUrl":null,"url":null,"abstract":"Degradation kinetics in thick films based on Cu<inf>0.1</inf>Ni<inf>0.1</inf>Co<inf>1.6</inf>Mn<inf>1.2</inf>O<inf>4</inf> ceramics at temperature of 170 <sup>o</sup>C have been investigated. Analytical description of processes in these materials was performed using relaxation functions. It is shown, that studied degradation kinetics are adequately described by compression-exponential relaxation function.","PeriodicalId":6754,"journal":{"name":"2019 International Conference on Information and Telecommunication Technologies and Radio Electronics (UkrMiCo)","volume":"14 1","pages":"1-4"},"PeriodicalIF":0.0000,"publicationDate":"2019-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2019 International Conference on Information and Telecommunication Technologies and Radio Electronics (UkrMiCo)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/UkrMiCo47782.2019.9165493","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
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Abstract
Degradation kinetics in thick films based on Cu0.1Ni0.1Co1.6Mn1.2O4 ceramics at temperature of 170 oC have been investigated. Analytical description of processes in these materials was performed using relaxation functions. It is shown, that studied degradation kinetics are adequately described by compression-exponential relaxation function.
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