The influence of 2 at. % Si addition on the annealing of radiation-induced defects in the Fe-13Cr alloy

A. Nikolaev
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Abstract

The paper presents data on electrical resistivity recovery in the Fe-13.4Cr and Fe13.6Cr-1.9Si alloys during isochronal annealing after 5 MeV electron irradiation below 77 K. Long-range migration of radiation-induced defects starts slightly above 200 K in Fe-13.4Cr. The silicon addition in Fe13.6Cr-1.9Si leads to immobilization of Frenkel pair defects thus making the peaks of the stages of the onset of long-range migration shift towards high temperatures up to 370 K and 420 K for self-interstitial atoms and vacancies, respectively. This finding confirms the data obtained earlier for Fe16Cr-Si alloys by means of positron annihilation technique (JNM 508(2018) 100–106) on trapping of radiation-induced defects on Si agglomerates (clusters consisting of several silicon atoms) formed during defect migration.
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2 at的影响。添加% Si对Fe-13Cr合金辐射缺陷退火的影响
本文介绍了Fe-13.4Cr和Fe13.6Cr-1.9Si合金在77 K以下5 MeV电子辐照等时退火过程中的电阻率恢复数据。在Fe-13.4Cr中,辐射诱导缺陷的远程迁移开始于略高于200k的位置。在Fe13.6Cr-1.9Si中加入硅导致Frenkel对缺陷的固定化,从而使自间隙原子和空位的远程迁移起始阶段的峰值分别向高达370 K和420 K的高温移动。这一发现证实了之前通过正电子湮没技术(JNM 508(2018) 100-106)获得的Fe16Cr-Si合金在缺陷迁移过程中形成的Si团聚体(由几个硅原子组成的团簇)上捕获辐射诱导缺陷的数据。
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