Optimization of Ar-diluted N2 electoron cyclotron resonance plasma for high-quality SiN film growth at low temperature
N. Luu, Liwei Zhao, Dong Wang, Y. Sugimoto, 杉本 陽平, K. Ikeda, 池田 賢一, H. Nakashima, 中島 英治, H. Nakashima, 中島 寛, ヨウヘイ スギモト, ケンイチ イケダ, ヒデハル ナカシマ, ヒロシ ナカシマ
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