Preparation and characterization of Fe4N thin film deposited by high power impulse magnetron sputtering

N. Pandey, M. Gupta, D. M. Phase
{"title":"Preparation and characterization of Fe4N thin film deposited by high power impulse magnetron sputtering","authors":"N. Pandey, M. Gupta, D. M. Phase","doi":"10.1063/1.5113132","DOIUrl":null,"url":null,"abstract":"In this work, high power impulse magnetron sputtering (HiPIMS) was used for the first time to grow Fe4N films. The Fe4N phase can only be formed when N is precisely at 20 at. %. Therefore, it is expected that the Fe4N phase can be obtained by optimization of growth parameters such as N2 gas flow, substrate temperature (Ts) etc. We varied process parameters and found that under optimized conditions single phase Fe4N phase can be obtained at Ts=675 K. Depth profile of Fe4N sample was studied using secondary ion mass spectroscopy and it was found that substantial inter-diffusion takes place between the substrate-film interface when Ts=675 K. This prohibits accurate estimation of saturation magnetization (Ms) by bulk magnetization methods. By using surface sensitive soft x-ray magnetic circular dichroism (MCD) we found that Ms is close to its theoretical value of about 2.5 µB/Fe atom. These are first ever MCD measurements performed on the soft x-ray absorption beamline BL-01 at Indus-2 synchrotron radiation source.In this work, high power impulse magnetron sputtering (HiPIMS) was used for the first time to grow Fe4N films. The Fe4N phase can only be formed when N is precisely at 20 at. %. Therefore, it is expected that the Fe4N phase can be obtained by optimization of growth parameters such as N2 gas flow, substrate temperature (Ts) etc. We varied process parameters and found that under optimized conditions single phase Fe4N phase can be obtained at Ts=675 K. Depth profile of Fe4N sample was studied using secondary ion mass spectroscopy and it was found that substantial inter-diffusion takes place between the substrate-film interface when Ts=675 K. This prohibits accurate estimation of saturation magnetization (Ms) by bulk magnetization methods. By using surface sensitive soft x-ray magnetic circular dichroism (MCD) we found that Ms is close to its theoretical value of about 2.5 µB/Fe atom. These are first ever MCD measurements performed on the soft x-ray absorption beamline BL-01 at Indus-2 synchrotron radiation s...","PeriodicalId":10874,"journal":{"name":"DAE SOLID STATE PHYSICS SYMPOSIUM 2018","volume":"1 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-07-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"DAE SOLID STATE PHYSICS SYMPOSIUM 2018","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1063/1.5113132","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

In this work, high power impulse magnetron sputtering (HiPIMS) was used for the first time to grow Fe4N films. The Fe4N phase can only be formed when N is precisely at 20 at. %. Therefore, it is expected that the Fe4N phase can be obtained by optimization of growth parameters such as N2 gas flow, substrate temperature (Ts) etc. We varied process parameters and found that under optimized conditions single phase Fe4N phase can be obtained at Ts=675 K. Depth profile of Fe4N sample was studied using secondary ion mass spectroscopy and it was found that substantial inter-diffusion takes place between the substrate-film interface when Ts=675 K. This prohibits accurate estimation of saturation magnetization (Ms) by bulk magnetization methods. By using surface sensitive soft x-ray magnetic circular dichroism (MCD) we found that Ms is close to its theoretical value of about 2.5 µB/Fe atom. These are first ever MCD measurements performed on the soft x-ray absorption beamline BL-01 at Indus-2 synchrotron radiation source.In this work, high power impulse magnetron sputtering (HiPIMS) was used for the first time to grow Fe4N films. The Fe4N phase can only be formed when N is precisely at 20 at. %. Therefore, it is expected that the Fe4N phase can be obtained by optimization of growth parameters such as N2 gas flow, substrate temperature (Ts) etc. We varied process parameters and found that under optimized conditions single phase Fe4N phase can be obtained at Ts=675 K. Depth profile of Fe4N sample was studied using secondary ion mass spectroscopy and it was found that substantial inter-diffusion takes place between the substrate-film interface when Ts=675 K. This prohibits accurate estimation of saturation magnetization (Ms) by bulk magnetization methods. By using surface sensitive soft x-ray magnetic circular dichroism (MCD) we found that Ms is close to its theoretical value of about 2.5 µB/Fe atom. These are first ever MCD measurements performed on the soft x-ray absorption beamline BL-01 at Indus-2 synchrotron radiation s...
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
高功率脉冲磁控溅射沉积Fe4N薄膜的制备与表征
在这项工作中,首次使用大功率脉冲磁控溅射(HiPIMS)来生长Fe4N薄膜。Fe4N相只有在N精确为20 at时才能形成。%。因此,可以期望通过优化生长参数如N2气体流量、衬底温度(Ts)等来获得Fe4N相。我们改变工艺参数,发现在优化条件下,在Ts=675 K时可以得到单相Fe4N相。利用二次离子质谱法研究了Fe4N样品的深度分布,发现当Ts=675 K时,基膜界面之间发生了大量的互扩散。这妨碍了用体磁化方法准确估计饱和磁化强度(Ms)。通过表面敏感软x射线磁圆二色性(MCD),我们发现Ms接近其理论值约2.5µB/Fe原子。这是在Indus-2同步加速器辐射源上对软x射线吸收光束线BL-01进行的首次MCD测量。在这项工作中,首次使用大功率脉冲磁控溅射(HiPIMS)来生长Fe4N薄膜。Fe4N相只有在N精确为20 at时才能形成。%。因此,可以期望通过优化生长参数如N2气体流量、衬底温度(Ts)等来获得Fe4N相。我们改变工艺参数,发现在优化条件下,在Ts=675 K时可以得到单相Fe4N相。利用二次离子质谱法研究了Fe4N样品的深度分布,发现当Ts=675 K时,基膜界面之间发生了大量的互扩散。这妨碍了用体磁化方法准确估计饱和磁化强度(Ms)。通过表面敏感软x射线磁圆二色性(MCD),我们发现Ms接近其理论值约2.5µB/Fe原子。这是在Indus-2同步辐射系统上首次对软x射线吸收光束线BL-01进行的MCD测量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Structural, dielectric, semiconducting and optical properties of high-energy ball milled YFeO3 nano-particles Synergistic effect of rGO loading on Ni doped ZnO nanorods for enhanced photocatalytic performance The role of solvent in the formation of biodegradable polymer nanoparticles Thermal and optical properties of flake-like copper oxide nanostructure Bithiophene based red light emitting material - Photophysical and DFT studies
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1