A. Tsukamoto, W. Kamisaka, H. Senda, N. Niisoe, H. Aoki, T. Otagaki, Y. Shigeta, M. Asaumi, Y. Miyata, Y. Sano, T. Kuriyama, S. Terakawa
{"title":"High sensitivity pixel technology for a 1/4-inch PAL 430 k pixel IT-CCD","authors":"A. Tsukamoto, W. Kamisaka, H. Senda, N. Niisoe, H. Aoki, T. Otagaki, Y. Shigeta, M. Asaumi, Y. Miyata, Y. Sano, T. Kuriyama, S. Terakawa","doi":"10.1109/CICC.1996.510508","DOIUrl":null,"url":null,"abstract":"A new pixel technology has been developed for a 1/4-inch 430 k (PAL) pixel IT-CCD (Inter-line Transfer Charge Coupled Device). The new pixel has a thin light shield made of tungsten silicide film and an inner-layer optical micro-lens pre-defined by BPSG flow. This process technology can reduce the pixel size to 22.6 /spl mu/m/sup 2/ with improved sensitivity and reduced smear value. The sensitivity is increased by 30% and the smear value is reduced by 6dB compared to a conventional pixel technology. These characteristics are comparable to a conventional 1/3-inch 560 k pixel IT-CCD with the pixel size of 33.6 /spl mu/m/sup 2/.","PeriodicalId":74515,"journal":{"name":"Proceedings of the ... Custom Integrated Circuits Conference. Custom Integrated Circuits Conference","volume":"167 1","pages":"39-42"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the ... Custom Integrated Circuits Conference. Custom Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.1996.510508","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
A new pixel technology has been developed for a 1/4-inch 430 k (PAL) pixel IT-CCD (Inter-line Transfer Charge Coupled Device). The new pixel has a thin light shield made of tungsten silicide film and an inner-layer optical micro-lens pre-defined by BPSG flow. This process technology can reduce the pixel size to 22.6 /spl mu/m/sup 2/ with improved sensitivity and reduced smear value. The sensitivity is increased by 30% and the smear value is reduced by 6dB compared to a conventional pixel technology. These characteristics are comparable to a conventional 1/3-inch 560 k pixel IT-CCD with the pixel size of 33.6 /spl mu/m/sup 2/.
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