Post-Deposition Recrystallization of Co-Evaporated CuInxGa(1-x)Se2 Films by Bromide Vapor Treatments

Elizabeth Palmiotti, S. Karki, Benjamin Belfore, Sina Soltanmohammad, G. Rajan, S. Marsillac, A. Rockett
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引用次数: 4

Abstract

CIGS films deposited at 400°C onto molybdenum-coated soda-lime glass substrates by co-evaporation were annealed in InBr3 vapors or CuBr with Se vapors. The treatments were conducted at 400°C, 450°C, or 500°C for one hour. The InBr3 treatments above 400°C and CuBr with Se treatments at 500°C resulted in increased grain size, improved crystallinity, and a decrease in Cu2Se phase. Annealed samples also exhibited large surface facets. CIGS films deposited at 350°C were also investigated in InBr3 and CuBr with Se vapors at 450°C for one hour. These treatments resulted in increased grain size and less deviations from the as-deposited composition.
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溴化物蒸汽处理共蒸发CuInxGa(1-x)Se2薄膜沉积后的再结晶
在400°C下通过共蒸发将CIGS薄膜沉积在钼包覆的钠石灰玻璃衬底上,并在InBr3蒸气或CuBr蒸气中与Se蒸气进行退火。分别在400°C、450°C或500°C下处理1小时。400°C以上的InBr3处理和500°C的cur + Se处理导致晶粒尺寸增大,结晶度提高,Cu2Se相减少。退火后的样品也表现出较大的表面切面。在350°C下沉积的CIGS薄膜也在450°C下用Se气相在InBr3和CuBr中沉积1小时进行了研究。这些处理增加了晶粒尺寸,减少了与沉积时成分的偏差。
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