High plasma H2O2 level and low plasma catalase level as risk factors for acne vulgaris

A. A. Wiraguna, Made Wardhana, M. Maharani
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Abstract

Background: In this recent time, ROS and oxidative stress have been said to play an important role in the pathogenesis of inflamed acne lesions. One example of ROS produced by neutrophil through phagocytosis is H2O2. Nevertheless, there is an enzymatic antioxidant which catalyses H2O2 called catalase. Imbalance of free radicals and antioxidants due to excessive ROS formation promotes the state of oxidative stress and inflammation of the acne lesion.Objective: This study aimed to determine plasma H2O2 and catalase level as a risk factor for acne.Methods: This matched-pair case-control observational analytic study involving 38 patients with acne and 38 patients without acne. Sampling was done using consecutive sampling which fulfils the inclusion and exclusion criteria and followed by matching with age and gender. H2O2 and catalase level measured on both groups. The analysis was done using SPSS.Results: H2O2 mean level in the case and control group, respectively 0.68 ± 0.03 and 0.42 ± 0.04 µmol/ml. High H2O2 level was determined from cut-off point >0.62 µmol/ml. High H2O2 was a statistically significant risk factor for acne vulgaris (p<0.001; 95% CI: 4.59-40.62; OR: 13.67). The mean level of catalase in the case and control group respectively 0.48 ± 0.06 and 0.74 ± 0.07 U/ml. Low catalase level was determined from the cut-off point <0.58 U/ml. Catalase was significant risk factor for acne vulgaris (p<0.001; 95% CI: 5.18-77.21; OR: 20.00).Conclusion: High levels of H2O2 plasma and low levels of catalase plasma is a risk factor of acne vulgaris.
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高血浆H2O2水平和低血浆过氧化氢酶水平是寻常性痤疮的危险因素
背景:近年来,ROS和氧化应激被认为在炎症性痤疮病变的发病机制中起重要作用。中性粒细胞通过吞噬作用产生ROS的一个例子是H2O2。然而,有一种酶促抗氧化剂可以催化过氧化氢酶。过量ROS形成导致自由基和抗氧化剂失衡,促进痤疮病变的氧化应激和炎症状态。目的:本研究旨在确定血浆H2O2和过氧化氢酶水平作为痤疮的危险因素。方法:对38例痤疮患者和38例无痤疮患者进行配对病例对照观察性分析研究。抽样采用符合纳入和排除标准的连续抽样,然后与年龄和性别进行匹配。测定两组的H2O2和过氧化氢酶水平。使用SPSS进行分析。结果:病例组和对照组H2O2平均水平分别为0.68±0.03和0.42±0.04µmol/ml。截止点>0.62µmol/ml为高H2O2水平。高H2O2是寻常痤疮的危险因素(p<0.001;95% ci: 4.59-40.62;或者:13.67)。病例组和对照组过氧化氢酶平均水平分别为0.48±0.06和0.74±0.07 U/ml。截断点<0.58 U/ml为低过氧化氢酶水平。过氧化氢酶是寻常痤疮的显著危险因素(p<0.001;95% ci: 5.18-77.21;或者:20.00)。结论:血浆过氧化氢酶水平高、过氧化氢酶水平低是寻常性痤疮的危险因素。
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