K. Srinivasarao, G. Srinivasarao, K. Madhuri, K. Murthy, P. Mukhopadhyay
{"title":"Preparation and Characterization of R.F. Magnetron Sputtered Mo:ZnO Thin Films","authors":"K. Srinivasarao, G. Srinivasarao, K. Madhuri, K. Murthy, P. Mukhopadhyay","doi":"10.1155/2013/684730","DOIUrl":null,"url":null,"abstract":"The ZnO and Mo:ZnO thin films were deposited by radio frequency magnetron sputtering on quartz and intrinsic silicon (100) substrates at a fixed combined partial pressure mbar of Ar","PeriodicalId":13278,"journal":{"name":"Indian Journal of Materials Science","volume":"32 1","pages":"1-7"},"PeriodicalIF":0.0000,"publicationDate":"2013-10-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"7","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Indian Journal of Materials Science","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1155/2013/684730","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 7
Abstract
The ZnO and Mo:ZnO thin films were deposited by radio frequency magnetron sputtering on quartz and intrinsic silicon (100) substrates at a fixed combined partial pressure mbar of Ar
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
