Rapid device prototyping using the CORNERSTONE platform (Conference Presentation)

C. Littlejohns, Ying Tran, H. Du, S. Stankovic, Xingzhao Yan, G. Sharp, M. Sorel, R. Webb, Jonathon England, H. Chong, F. Gardes, D. Thomson, G. Mashanovich, G. Reed
{"title":"Rapid device prototyping using the CORNERSTONE platform (Conference Presentation)","authors":"C. Littlejohns, Ying Tran, H. Du, S. Stankovic, Xingzhao Yan, G. Sharp, M. Sorel, R. Webb, Jonathon England, H. Chong, F. Gardes, D. Thomson, G. Mashanovich, G. Reed","doi":"10.1117/12.2508850","DOIUrl":null,"url":null,"abstract":"The field of silicon photonics has expanded rapidly over the past several decades. This has led to a degree of standardisation in the commercial device fabrication foundries that are available for universities and fabless companies alike. Whilst this is advantageous in terms of yield, repeatability etc., it is not conducive for researchers to develop new and novel devices for future systems. CORNERSTONE offers researchers a flexible device prototyping capability that can support photonics research around the world.\nThe CORNERSTONE project (Capability for OptoelectRoNics, mEtamateRialS, nanoTechnOlogy, aNd sEnsing) is a UK Engineering and Physical Sciences Research Council (EPSRC) funded project between 3 UK universities: University of Southampton, University of Glasgow and University of Surrey. The project is based on deep-ultraviolet (DUV) photolithography equipment, installed at the University of Southampton, centred around a 248 nm Scanner, the first of its kind in a UK university. Utilising these facilities, CORNERSTONE will offer a multi-project wafer (MPW) service on several silicon-on-insulator (SOI) platforms (220 nm, 340 nm & 500 nm) for both passive and active silicon photonic devices.\nThis talk will give an overview of the CORNERSTONE project, present some of its early data, and summarise future MPW offerings.","PeriodicalId":21725,"journal":{"name":"Silicon Photonics XIV","volume":"9 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Silicon Photonics XIV","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2508850","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

The field of silicon photonics has expanded rapidly over the past several decades. This has led to a degree of standardisation in the commercial device fabrication foundries that are available for universities and fabless companies alike. Whilst this is advantageous in terms of yield, repeatability etc., it is not conducive for researchers to develop new and novel devices for future systems. CORNERSTONE offers researchers a flexible device prototyping capability that can support photonics research around the world. The CORNERSTONE project (Capability for OptoelectRoNics, mEtamateRialS, nanoTechnOlogy, aNd sEnsing) is a UK Engineering and Physical Sciences Research Council (EPSRC) funded project between 3 UK universities: University of Southampton, University of Glasgow and University of Surrey. The project is based on deep-ultraviolet (DUV) photolithography equipment, installed at the University of Southampton, centred around a 248 nm Scanner, the first of its kind in a UK university. Utilising these facilities, CORNERSTONE will offer a multi-project wafer (MPW) service on several silicon-on-insulator (SOI) platforms (220 nm, 340 nm & 500 nm) for both passive and active silicon photonic devices. This talk will give an overview of the CORNERSTONE project, present some of its early data, and summarise future MPW offerings.
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
使用CORNERSTONE平台的快速设备原型设计(会议报告)
硅光子学领域在过去的几十年里发展迅速。这导致了商业设备制造代工厂的一定程度的标准化,这些代工厂适用于大学和无晶圆厂公司。虽然这在产量、可重复性等方面是有利的,但不利于研究人员为未来的系统开发新的设备。CORNERSTONE为研究人员提供了灵活的设备原型设计能力,可以支持世界各地的光子学研究。CORNERSTONE项目(光电、超材料、纳米技术和传感能力)是由英国工程和物理科学研究委员会(EPSRC)资助的3所英国大学:南安普顿大学、格拉斯哥大学和萨里大学。该项目基于深紫外(DUV)光刻设备,安装在南安普顿大学,围绕248纳米扫描仪,这是英国大学的第一个此类设备。利用这些设施,CORNERSTONE将在几种绝缘体上硅(SOI)平台(220 nm、340 nm和500 nm)上为无源和有源硅光子器件提供多项目晶圆(MPW)服务。本讲座将概述CORNERSTONE项目,介绍其早期数据,并总结未来的MPW产品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Gas sensing devices using doped silicon material at mid-infrared region Front Matter: Volume 10923 On-chip amplifiers and lasers on the Al2O3 integrated photonics platform (Conference Presentation) Silicon 'photonic molecules' for sensing applications (Conference Presentation) Hydrogen passivation and microstructure fabrication in erbium silicates for optical amplification applications around 1.5 um (Conference Presentation)
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1