C. Littlejohns, Ying Tran, H. Du, S. Stankovic, Xingzhao Yan, G. Sharp, M. Sorel, R. Webb, Jonathon England, H. Chong, F. Gardes, D. Thomson, G. Mashanovich, G. Reed
{"title":"Rapid device prototyping using the CORNERSTONE platform (Conference Presentation)","authors":"C. Littlejohns, Ying Tran, H. Du, S. Stankovic, Xingzhao Yan, G. Sharp, M. Sorel, R. Webb, Jonathon England, H. Chong, F. Gardes, D. Thomson, G. Mashanovich, G. Reed","doi":"10.1117/12.2508850","DOIUrl":null,"url":null,"abstract":"The field of silicon photonics has expanded rapidly over the past several decades. This has led to a degree of standardisation in the commercial device fabrication foundries that are available for universities and fabless companies alike. Whilst this is advantageous in terms of yield, repeatability etc., it is not conducive for researchers to develop new and novel devices for future systems. CORNERSTONE offers researchers a flexible device prototyping capability that can support photonics research around the world.\nThe CORNERSTONE project (Capability for OptoelectRoNics, mEtamateRialS, nanoTechnOlogy, aNd sEnsing) is a UK Engineering and Physical Sciences Research Council (EPSRC) funded project between 3 UK universities: University of Southampton, University of Glasgow and University of Surrey. The project is based on deep-ultraviolet (DUV) photolithography equipment, installed at the University of Southampton, centred around a 248 nm Scanner, the first of its kind in a UK university. Utilising these facilities, CORNERSTONE will offer a multi-project wafer (MPW) service on several silicon-on-insulator (SOI) platforms (220 nm, 340 nm & 500 nm) for both passive and active silicon photonic devices.\nThis talk will give an overview of the CORNERSTONE project, present some of its early data, and summarise future MPW offerings.","PeriodicalId":21725,"journal":{"name":"Silicon Photonics XIV","volume":"9 1","pages":""},"PeriodicalIF":0.0000,"publicationDate":"2019-03-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Silicon Photonics XIV","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2508850","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2
Abstract
The field of silicon photonics has expanded rapidly over the past several decades. This has led to a degree of standardisation in the commercial device fabrication foundries that are available for universities and fabless companies alike. Whilst this is advantageous in terms of yield, repeatability etc., it is not conducive for researchers to develop new and novel devices for future systems. CORNERSTONE offers researchers a flexible device prototyping capability that can support photonics research around the world.
The CORNERSTONE project (Capability for OptoelectRoNics, mEtamateRialS, nanoTechnOlogy, aNd sEnsing) is a UK Engineering and Physical Sciences Research Council (EPSRC) funded project between 3 UK universities: University of Southampton, University of Glasgow and University of Surrey. The project is based on deep-ultraviolet (DUV) photolithography equipment, installed at the University of Southampton, centred around a 248 nm Scanner, the first of its kind in a UK university. Utilising these facilities, CORNERSTONE will offer a multi-project wafer (MPW) service on several silicon-on-insulator (SOI) platforms (220 nm, 340 nm & 500 nm) for both passive and active silicon photonic devices.
This talk will give an overview of the CORNERSTONE project, present some of its early data, and summarise future MPW offerings.