Designed and Produced the Rotary Substrate Holder and Its Optimized in Angular DC Magnetron Co-Sputtering System

IF 0.6 4区 综合性期刊 Q3 MULTIDISCIPLINARY SCIENCES Chiang Mai Journal of Science Pub Date : 2022-11-30 DOI:10.12982/cmjs.2022.106
Preecha Changyom, K. Leksakul, N. Charoenchai, D. Boonyawan
{"title":"Designed and Produced the Rotary Substrate Holder and Its Optimized in Angular DC Magnetron Co-Sputtering System","authors":"Preecha Changyom, K. Leksakul, N. Charoenchai, D. Boonyawan","doi":"10.12982/cmjs.2022.106","DOIUrl":null,"url":null,"abstract":"We report the design approach of a home-built rotary substrate holder on simple rotation stages for low-pressure vacuum applications. The result of designing and fabricating the rotary substrate holder that it can be successfully used to rotate the substrate in a low-pressure vacuum application without pressure fl uctuations and leakage. Then we investigated the suitable thin fi lm deposition by fabricating optimal multilayer coatings under three variable operating conditions: Speed of substrate, deposition time, and discharge voltage. The thin film deposition result of three copper targets was mounted on each magnetron gun, providing a total of three magnetron guns. The thin fi lm was deposited on a glass slide at room temperature using a custom-built angular DC magnetron co-sputtering system. Analysis of variance for the response surface regression model of film thickness as a function of the three independent variables shows that substrate rotation speed, sputtering time, sputtering voltage, and coeffi cient of squared sputtering time are the most signifi cant factors in determining the optimum film thickness. The optimum thin-film deposition with substrate rotation speed, sputtering time, and sputtering voltage of 10 rpm, 8.61 min, and 200%V, respectively, maximizes the thickness of 72.036 nm.","PeriodicalId":9884,"journal":{"name":"Chiang Mai Journal of Science","volume":"12 1","pages":""},"PeriodicalIF":0.6000,"publicationDate":"2022-11-30","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Chiang Mai Journal of Science","FirstCategoryId":"103","ListUrlMain":"https://doi.org/10.12982/cmjs.2022.106","RegionNum":4,"RegionCategory":"综合性期刊","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"MULTIDISCIPLINARY SCIENCES","Score":null,"Total":0}
引用次数: 1

Abstract

We report the design approach of a home-built rotary substrate holder on simple rotation stages for low-pressure vacuum applications. The result of designing and fabricating the rotary substrate holder that it can be successfully used to rotate the substrate in a low-pressure vacuum application without pressure fl uctuations and leakage. Then we investigated the suitable thin fi lm deposition by fabricating optimal multilayer coatings under three variable operating conditions: Speed of substrate, deposition time, and discharge voltage. The thin film deposition result of three copper targets was mounted on each magnetron gun, providing a total of three magnetron guns. The thin fi lm was deposited on a glass slide at room temperature using a custom-built angular DC magnetron co-sputtering system. Analysis of variance for the response surface regression model of film thickness as a function of the three independent variables shows that substrate rotation speed, sputtering time, sputtering voltage, and coeffi cient of squared sputtering time are the most signifi cant factors in determining the optimum film thickness. The optimum thin-film deposition with substrate rotation speed, sputtering time, and sputtering voltage of 10 rpm, 8.61 min, and 200%V, respectively, maximizes the thickness of 72.036 nm.
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设计制作了角直流磁控共溅射系统中的旋转基板支架并对其进行了优化
我们报告了一种自制的旋转基板支架的设计方法,用于低压真空应用的简单旋转阶段。设计和制造的旋转基板支架的结果是,它可以成功地用于在低压真空应用中旋转基板,没有压力波动和泄漏。然后,我们在基材速度、沉积时间和放电电压三种不同的工作条件下,通过制备最佳的多层膜来研究合适的薄膜沉积。将三个铜靶的薄膜沉积结果分别安装在每个磁控管枪上,共提供三个磁控管枪。在室温下,使用特制的角直流磁控共溅射系统将薄膜沉积在玻璃载玻片上。对膜厚响应面回归模型作为三个自变量的方差分析表明,衬底转速、溅射时间、溅射电压和溅射时间平方系数是决定最佳膜厚的最重要因素。当衬底转速为10 rpm,溅射时间为8.61 min,溅射电压为200%V时,薄膜的最大厚度为72.036 nm。
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来源期刊
Chiang Mai Journal of Science
Chiang Mai Journal of Science MULTIDISCIPLINARY SCIENCES-
CiteScore
1.00
自引率
25.00%
发文量
103
审稿时长
3 months
期刊介绍: The Chiang Mai Journal of Science is an international English language peer-reviewed journal which is published in open access electronic format 6 times a year in January, March, May, July, September and November by the Faculty of Science, Chiang Mai University. Manuscripts in most areas of science are welcomed except in areas such as agriculture, engineering and medical science which are outside the scope of the Journal. Currently, we focus on manuscripts in biology, chemistry, physics, materials science and environmental science. Papers in mathematics statistics and computer science are also included but should be of an applied nature rather than purely theoretical. Manuscripts describing experiments on humans or animals are required to provide proof that all experiments have been carried out according to the ethical regulations of the respective institutional and/or governmental authorities and this should be clearly stated in the manuscript itself. The Editor reserves the right to reject manuscripts that fail to do so.
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