TCAD Simulation of the Electrical Characteristics of Polycrystalline Silicon Thin Film Transistor

H. Tayoub, Baya Zebentouta, Z. Benamara
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Abstract

Low-temperature polycrystalline silicon thin film transistors (poly-Si TFTs) have been studied because of their high performance in Active Matrix Liquid Crystal Displays (AMLCD's) and Active Matrix Organic Light-Emitting Diode (AMOLED) applications. The purpose of this work is to simulate the impact of varying the electrical and physical parameters (the interface states, active layer's thickness and BBT model) in the transfer characteristics of poly-Si TFT to extract the electrical parameters like the threshold voltage, the mobility and to evaluate the device performance. The device was simulated using ATLAS software from Silvaco, the results show that the electrical and physical parameters of poly-Si TFT affect significantly its transfer characteristics, choosing suitable parameters improve high-performance transistor. Such results make the designed structure a promising element for large-scale electronics applications.
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多晶硅薄膜晶体管电特性的TCAD仿真
低温多晶硅薄膜晶体管(poly-Si TFTs)由于其在有源矩阵液晶显示器(AMLCD)和有源矩阵有机发光二极管(AMOLED)中的高性能而受到广泛的研究。本工作的目的是模拟改变电学和物理参数(界面状态、有源层厚度和BBT模型)对多晶硅TFT转移特性的影响,以提取阈值电压、迁移率等电学参数,并评估器件性能。利用Silvaco公司的ATLAS软件对器件进行仿真,结果表明,多晶硅TFT的电学和物理参数对其传输特性有显著影响,选择合适的参数可提高晶体管的高性能。这些结果使所设计的结构成为大规模电子应用的有前途的元件。
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