{"title":"A novel RF-MEMS shunt capacitive switch design for dielectric charging mitigation","authors":"Yuhao Liu, Songjie Bi, Yusha Bey, X. Liu","doi":"10.1109/IMWS-AMP.2015.7324955","DOIUrl":null,"url":null,"abstract":"This paper reports on the design, fabrication, and measurement of a new electromechanical implementation for the mitigation of dielectric charging on the signal line and substrate for RF-MEMS shunt switches. Electrostatically shielded, externally-positioned, dielectric-less actuation electrodes with mechanical stoppers are fabricated above the MEMS bridge to isolate the RF and substrate dielectrics from the DC biasing electric fields. In the ON-state, the switch exhibits a measured insertion loss of -0.32dB at 10GHz and -0.69 dB at 20GHz. In the OFF-state, the measured isolation is 15dB at 10GHz and 24dB at 20GHz.","PeriodicalId":6625,"journal":{"name":"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)","volume":"48 1","pages":"1-3"},"PeriodicalIF":0.0000,"publicationDate":"2015-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2015 IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMWS-AMP.2015.7324955","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1
Abstract
This paper reports on the design, fabrication, and measurement of a new electromechanical implementation for the mitigation of dielectric charging on the signal line and substrate for RF-MEMS shunt switches. Electrostatically shielded, externally-positioned, dielectric-less actuation electrodes with mechanical stoppers are fabricated above the MEMS bridge to isolate the RF and substrate dielectrics from the DC biasing electric fields. In the ON-state, the switch exhibits a measured insertion loss of -0.32dB at 10GHz and -0.69 dB at 20GHz. In the OFF-state, the measured isolation is 15dB at 10GHz and 24dB at 20GHz.