Lin Jiang, Weiming Zhang, Tracy Guo, David Kapp, Li Yan, Larry Wang
{"title":"An improved mathematical modeling to simulate metallization screen pattern trend for silicon solar cell","authors":"Lin Jiang, Weiming Zhang, Tracy Guo, David Kapp, Li Yan, Larry Wang","doi":"10.1109/PVSC.2013.6745016","DOIUrl":null,"url":null,"abstract":"The series resistance calculation based on H-type model has been widely used to understand power loss mechanism in semiconductor solar cell, and one of its popular applications is to predict optimal metallization screen printing pattern. The disadvantage of this model is that it is not accurate to estimate the relationship of screen pattern trend vs. cell efficiency, since it is based on an ideal rectangular finger shape, which does not exist in present regular screen printing process. In this work, a revised model is proposed to simulate the contact resistant power loss in multi-crystalline silicon solar cell. Improved accuracy of the new model is found by comparing the simulation results to the I-V testing data of multi-crystalline silicon solar cell printed with Heraeus 96XX front Ag paste.","PeriodicalId":6350,"journal":{"name":"2013 IEEE 39th Photovoltaic Specialists Conference (PVSC)","volume":"55 1","pages":"2641-2645"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE 39th Photovoltaic Specialists Conference (PVSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2013.6745016","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15
Abstract
The series resistance calculation based on H-type model has been widely used to understand power loss mechanism in semiconductor solar cell, and one of its popular applications is to predict optimal metallization screen printing pattern. The disadvantage of this model is that it is not accurate to estimate the relationship of screen pattern trend vs. cell efficiency, since it is based on an ideal rectangular finger shape, which does not exist in present regular screen printing process. In this work, a revised model is proposed to simulate the contact resistant power loss in multi-crystalline silicon solar cell. Improved accuracy of the new model is found by comparing the simulation results to the I-V testing data of multi-crystalline silicon solar cell printed with Heraeus 96XX front Ag paste.
京公网安备 11010802042870号
京ICP备2023020795号-1
分享
求助内容：
应助结果提醒方式：
扫码关注我们
