Design Flow and Methodology on the Design of BAW components

E. Schmidhammer, B. Bader, W. Sauer, M. Schmiedgen, H. Heinze, C. Eggs, T. Metzger
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引用次数: 12

Abstract

Bulk Acoustic Wave (BAW) technology based on the sputtering of piezoelectric thin films on high resistive silicon has recently emerged as one of the preferred technologies for the realization of miniaturized high performance RF filters and duplexers for wireless CDMA-based applications like mobile phones. We present the performance improvements within the development of a duplexer for US-PCS-CDMA applications with a footprint of 3.8mm × 3.8mm and a height of 1.1mm. The duplexer consists of a transmit (TX) and a receive (RX) filter, which are flip-chipped as bare dies on a low temperature co-fired ceramic (LTCC) multilayer substrate incorporating additional matching elements. The filters are realized using solidly mounted resonator (SMR) technology, where an acoustic mirror separates the active resonator from the substrate. Duplexer packaging is based on the EPCOS’ proprietary CSSP technology, originally developed to further shrink the size of SAW devices. This technology includes a cavity between the package and the acoustically active filter areas and therefore keeps the surface of the active device protected from environmental influences. The front-end technology for realizing the RF filters uses standard 200 mm CMOS technology and the deposition of AlN piezoelectric thin films with high thickness uniformity over the wafer. The duplexer is fully matched to 50 Ohm with low insertion attenuation in the pass band, a superior stop band characteristic up to 10 GHz, and a temperature coefficient of frequency (TCF) of −20 ppm/K.
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BAW组件设计流程与方法研究
基于高阻硅上压电薄膜溅射的体声波(BAW)技术最近成为实现基于移动电话等无线cdma应用的小型化高性能射频滤波器和双工器的首选技术之一。我们提出了一种用于US-PCS-CDMA应用的双工器的性能改进,其占地面积为3.8mm × 3.8mm,高度为1.1mm。双工器由一个发射(TX)和一个接收(RX)滤波器组成,它们作为裸晶片倒装在低温共烧陶瓷(LTCC)多层基板上,并包含额外的匹配元件。滤波器采用固体安装谐振器(SMR)技术实现,其中声镜将有源谐振器与衬底分离。双工封装基于爱普科斯专有的CSSP技术,最初是为了进一步缩小SAW器件的尺寸而开发的。该技术包括封装和声学有源滤波器区域之间的空腔,因此可以保护有源器件的表面免受环境影响。实现射频滤波器的前端技术采用标准的200 mm CMOS技术,并在晶圆上沉积具有高厚度均匀性的AlN压电薄膜。该双工器与50欧姆完全匹配,通带插入衰减低,阻带特性高达10 GHz,频率温度系数(TCF)为- 20 ppm/K。
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