Investigating the Effects of Biaxial Strain on the Electronic, Optical and Thermoelectric Properties of the Puckered Si2SeTe Monolayer

IF 0.8 4区 材料科学 Q4 MATERIALS SCIENCE, MULTIDISCIPLINARY Journal of Nano Research Pub Date : 2023-09-05 DOI:10.4028/p-19tzA3
Hamza Rghioui, A. Marjaoui, M. A. Tamerd, M. Zanouni
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Abstract

In this paper, we have investigated the electronic, optical and thermoelectric properties of the puckered Si2SeTe monolayer when subjected to various levels of biaxial strain ranging from −10% to +10%. The structural stability, as determined by the cohesive energy, shows that the puckered Si2SeTe structure is energetically stable. The results reveal that the unstrained Si2SeTe monolayer is an indirect band gap semiconductor with an energy gap of 0.5 eV, which can be effectively adjusted with biaxial strain. The semiconductor–metal phase transition occurs when the monolayer is compressed by −4% biaxial strain. Moreover, the optical properties, including the real ε1(ω) and imaginary ε2(ω) components of the dielectric function, extinction coefficient K(ω), reflectivity R(ω), refractive index n (ω), and absorption coefficient α (ω), were evaluated as a function of the energy of light and under biaxial strain. We discovered that the puckered Si2SeTe monolayer is capable of absorbing light in the visible region of 64.7×104 cm−1, 73.8×104 cm−1 for equilibrium state and under the compression strain (−8%), respectively. Lastly, the influence of biaxial strain on thermoelectric properties such as electrical conductivity (σ/τ), electronic thermal conductivity (ke/τ), Seebeck coefficients, and electronic figure of merit (ZTe) was studied. The calculated electronic figure of merit ZTe presents an improvement in the p-type doping (μ<0) under the tensile biaxial strain. Taking into account the optical and thermoelectric properties, the puckered Si2SeTe monolayer is a promising material for use in optoelectronic devices and energy conversion technologies.
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双轴应变对皱化Si2SeTe单层材料电子、光学和热电性能影响的研究
在本文中,我们研究了皱化Si2SeTe单层在- 10%到+10%的不同水平的双轴应变下的电子、光学和热电性能。由内聚能决定的结构稳定性表明,皱化Si2SeTe结构具有能量稳定性。结果表明,未应变的Si2SeTe单层为间接带隙半导体,能隙为0.5 eV,可通过双轴应变有效调节。当双轴应变为- 4%时,薄膜发生半导体-金属相变。在双轴应变作用下,计算了介电函数的实部ε1(ω)和虚部ε2(ω)分量、消光系数K(ω)、反射率R(ω)、折射率n (ω)和吸收系数α (ω)与光能的关系。我们发现皱化的Si2SeTe单层能够分别在64.7×104 cm−1,73.8×104 cm−1的可见光区域吸收平衡状态和压缩应变(- 8%)下的光。最后,研究了双轴应变对热电性能的影响,如电导率(σ/τ)、电子导热系数(ke/τ)、塞贝克系数和电子优值(ZTe)。在拉伸双轴应变下,中兴通讯的p型掺杂(μ<0)得到了改善。考虑到光学和热电性质,皱化的Si2SeTe单层是一种很有前途的材料,可用于光电器件和能量转换技术。
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来源期刊
Journal of Nano Research
Journal of Nano Research 工程技术-材料科学:综合
CiteScore
2.40
自引率
5.90%
发文量
55
审稿时长
4 months
期刊介绍: "Journal of Nano Research" (JNanoR) is a multidisciplinary journal, which publishes high quality scientific and engineering papers on all aspects of research in the area of nanoscience and nanotechnologies and wide practical application of achieved results. "Journal of Nano Research" is one of the largest periodicals in the field of nanoscience and nanotechnologies. All papers are peer-reviewed and edited. Authors retain the right to publish an extended and significantly updated version in another periodical.
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