Investigation of the effect of the addition H2O2 on the general corrosion of brass in hydrochloric acid

IF 0.2 Q4 CHEMISTRY, MULTIDISCIPLINARY Glasnik Hemicara i Tehnologa Bosne i Hercegovine Pub Date : 2022-06-30 DOI:10.35666/2232-7266.2022.58.05
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引用次数: 1

Abstract

In this paper, the influence of hydrochloric acid and the addition of oxidizing agents on the rate of general corrosion of brass was investigated. For comparison, the corrosion rate of copper and zinc in hydrochloric acid and in hydrochloric acid with oxidizing agent was also tested. The Taffel extrapolation method was used to examine the general corrosion of brass, copper and zinc. The Taffel extrapolation method involves scanning potential of the working electrode of ±250 mV in relation to its open-circuit otential (EOCP), at a speed of 0.5 mVs-1. Investigation of corrosion was conducted in a corrosion cell according to the ASTM G5 (ASTM G5-94) standard, on a potentiostat/galvanostat instrument, Princeton Applied Research, model 263A-2, with PowerCORR® software, which is part of the Power Suite softwere package. The tests were performed at room temperature, 20±1°C. The results show that the corrosion rate of brass is higher in hydrochloric acid with oxidizing agent than the corrosion rate of brass in hydrochloric acid. Examining the effect of hydrochloric acid and the addition of oxidizing agent on the rate of general corrosion of brass, it was found that the corrosion of brass has caused the zinc contained in it. Corrosion of zinc is highest in 0.1 M HCl + 0.1 M H2O2 compared to corrosion of brass and copper in 0.1 M HCl + 0.1 M H2O2, where corrosion of copper is lowest in 0.1 M HCl + 0.1 M H2O2.
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加入H2O2对黄铜在盐酸中一般腐蚀的影响研究
本文研究了盐酸和氧化剂的加入对黄铜一般腐蚀速率的影响。为了比较铜和锌在盐酸和加氧剂盐酸中的腐蚀速率。塔菲尔外推法被用来检验黄铜、铜和锌的一般腐蚀。Taffel外推法涉及扫描工作电极的±250 mV电位与其开路电位(EOCP)的关系,速度为0.5 mVs-1。根据ASTM G5 (ASTM G5-94)标准,在腐蚀池中对普林斯顿应用研究公司的电位器/恒流仪进行腐蚀调查,型号263A-2,使用powercorr®软件,该软件是Power Suite软件包的一部分。实验在室温下进行,20±1℃。结果表明,黄铜在含氧化剂的盐酸中的腐蚀速率高于黄铜在盐酸中的腐蚀速率。考察了盐酸和氧化剂的加入对黄铜一般腐蚀速率的影响,发现黄铜的腐蚀是由黄铜中所含的锌引起的。锌在0.1 M HCl + 0.1 M H2O2中腐蚀程度最高,黄铜和铜在0.1 M HCl + 0.1 M H2O2中腐蚀程度最低,铜在0.1 M HCl + 0.1 M H2O2中腐蚀程度最低。
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Glasnik Hemicara i Tehnologa Bosne i Hercegovine
Glasnik Hemicara i Tehnologa Bosne i Hercegovine CHEMISTRY, MULTIDISCIPLINARY-
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