Atom Lithography with Chromium

U. Drodofsky, M. Drewsen, B. Brezger, G. Schreiber, D. Krogmann, C. Weber, J. Stuhler, T. Pfau, J. MIynsk
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Abstract

Standing laser waves serve as an array of lenses for a well collimated and laser cooled chromium beam. A siljcon substrate put inlo the focal plane of that array can be patterned with lines or dots with a periodicity of half the wavelength of the light [l]. We report on an intenfie beam (at 80 cm from the nomce the 5nx corresponds to an evaporation rate of 0.8 A/E) of chromium We produce up to 300 mW of laser light (425 nm) by frequency doubling a TkSaphire-laser in a KNbO3-crystal. We did systematic studies of Dopplerand Sisyphus-cooling mechanisms in different configurations and can cool the chromium beam transversely down to a few recoil units The m u l l s are in excellent agreement with quantum Monte Carlo simulations. In contrast to mechanically coUimatiiig t h P bea.m we do not loomintenuity in the atomic beam, leading to deposition timea a6 high as 10 nmimin We report on experimentfi o n wr i t ing periodic nanostracturea (see fig. 1) with chromium with standing light fields generated by (.his syfitem. The written structures are characterised with an atomic force microscope. In a fiitilrr t l t ~ p t l i e scheme will be extended to two dimensions and different patterns.
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铬原子光刻
驻波激光作为一个阵列的透镜为一个良好的准直和激光冷却铬束。将硅衬底置于该阵列的焦平面中,可以用周期性为光波长一半的线或点来形成图案[1]。我们报道了铬的强光束(距离中心80厘米处,5nx对应于0.8 A/E的蒸发速率)。我们通过在knbo3晶体中加倍频率的tksaphire激光器产生高达300 mW (425 nm)的激光。我们对不同构型的多普勒和西西弗斯冷却机制进行了系统的研究,并可以将铬束横向冷却到几个反冲单位,这与量子蒙特卡罗模拟结果非常吻合。与机械计算P值相反。我们报道了一项实验,利用()产生的恒光场,用铬制备周期纳米结构(见图1)。他的syfitem。用原子力显微镜对书写结构进行了表征。在此基础上,将该方案扩展到二维和不同的模式。
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