Effect of Bias Voltage on Adhesion and Corrosion Resistance of Titanium Nitride Coated Stainless Steel Substrate

Talha Faizi, Abdullah Khan, R. Ali
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Abstract

In this work, the adhesion and corrosion resistance of TiN coating by magnetron sputtering on stainless steel substrates under different bias voltages conditions (-50 V and-100 V) was investigated. AFM was used for surface roughness and grain size analysis, XRD for phase identification, Rockwell C for adhesion and nanoindentation for hardness and elastic modulus. According to AFM the coating deposited at-100V bias had decreased surface roughness, the value decreased from 2.7 nm (for-50V sample) to 1.8 nm, this was due to an etching like process which occurs when ions with higher energies start hitting the surface. The coated samples came under HF1 adhesion parameter which is the highest class of adhesion in the model on the basis of Rockwell C adhesion test. nanoindentation hardness and elastic modulus results of-50 V and-100V were found to be 224 GPa and 182 GPa, respectively and the value of hardness, 16 GPa and 22 GPa, respectively. The corrosion behavior of TiN coatings were studied in 3.5wt. % NaCl solutions using Tafel Extrapolation, Cyclic Polarization and Open Circuit Potential. It was noted on the basis of these corrosion tests that, as bias voltage is increased, it leads to the formation of more densely packed, fine grained columnar structures with less pores, which decreases the chances of corrosion. .
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偏压对氮化钛涂层不锈钢基体附着力和耐蚀性的影响
本文研究了不同偏压条件(-50 V和100 V)下磁控溅射TiN涂层在不锈钢基体上的附着力和耐腐蚀性。AFM分析表面粗糙度和晶粒尺寸,XRD分析物相,Rockwell C分析附着力,纳米压痕分析硬度和弹性模量。根据AFM,在100v偏压下沉积的涂层表面粗糙度降低,从2.7 nm(对于50v样品)下降到1.8 nm,这是由于高能量离子开始撞击表面时发生的类似蚀刻的过程。根据Rockwell C黏附试验,涂层试样的黏附参数为HF1,为模型中最高的黏附等级。在50v和100v条件下,纳米压痕硬度和弹性模量分别为224 GPa和182 GPa,硬度分别为16 GPa和22 GPa。研究了TiN涂层在3.5wt下的腐蚀行为。使用Tafel外推法,循环极化和开路电位。在这些腐蚀试验的基础上,我们注意到,随着偏置电压的增加,它会导致形成更密集的排列,细晶柱状结构,气孔更少,从而降低腐蚀的机会。
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