{"title":"Efficiently embedding expertise in high-density process-portable standard cell generators","authors":"J. Duh, T. G. Matheson, E. L. Hepler","doi":"10.1109/CICC.1996.510605","DOIUrl":null,"url":null,"abstract":"A new approach to the creation of process-portable standard cell generators is described. The system efficiently captures designer expertise while automating the details of the cell layout process. The system takes advantage of the extensibility of the underlying symbolic layout system to provide process portability without sacrificing layout density. The system includes novel transistor-bending and mask-processing automation.","PeriodicalId":74515,"journal":{"name":"Proceedings of the ... Custom Integrated Circuits Conference. Custom Integrated Circuits Conference","volume":"7 1","pages":"497-500"},"PeriodicalIF":0.0000,"publicationDate":"1996-05-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"4","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings of the ... Custom Integrated Circuits Conference. Custom Integrated Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CICC.1996.510605","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 4
Abstract
A new approach to the creation of process-portable standard cell generators is described. The system efficiently captures designer expertise while automating the details of the cell layout process. The system takes advantage of the extensibility of the underlying symbolic layout system to provide process portability without sacrificing layout density. The system includes novel transistor-bending and mask-processing automation.
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