Synthesis of High Quality Complex Oxide Thin Films by Pulsed Laser Deposition

Hyomen Kagaku Pub Date : 2017-01-01 DOI:10.1380/jsssj.38.216
T. Ohnishi
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Abstract

Reproducible way to grow high quality complex oxide thin films by means of pulsed laser deposition is addressed. Laser ablation conditions are the most essential ones to be controlled precisely because it directly relates to cation ratio of deposited thin films. In some specific case, substrate temperature and gas pressure also become important to control the film composition. Film quality is tightly correlated to the thin film stoichiometry.
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脉冲激光沉积制备高质量复合氧化物薄膜
研究了用脉冲激光沉积法生长高质量复合氧化物薄膜的可重复性方法。激光烧蚀条件直接关系到沉积薄膜的阳离子比,是最需要精确控制的条件。在某些特定情况下,衬底温度和气体压力也成为控制薄膜成分的重要因素。薄膜质量与薄膜化学计量密切相关。
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