Effect of Processing Parameters on the Protective Quality of Electroless Nickel-Phosphorus on Cast Aluminium Alloy

O. Ajibola, D. Oloruntoba, B. O. Adewuyi
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引用次数: 4

Abstract

The effects of temperature, pH, and time variations on the protective amount and quality of electroless nickel (EN) deposition on cast aluminium alloy (CAA) substrates were studied. The temperature, pH, and plating time were varied while the surface condition of the substrate was kept constant in acid or alkaline bath. Within solution pH of 5.0–5.5 range, the best quality is obtained in acid solution pH of 5.2. At lower pH (5.0–5.1), good adhesion characterised the EN deposition. Within the range of plating solution pH of 7.0 to 11.5, the highest quantity and quality of EN deposition are obtained on CAA substrate in solution pH of 10.5. It is characterised with few pores and discontinuous metallic EN film. The quantity of EN deposition is time dependent, whereas the adhesion and brightness are not time controlled. The best fit models were developed from the trends of result data obtained from the experiments. The surface morphologies and the chemical composition of the coating were studied using the Jeol JSM-7600F field emission scanning electron microscope.
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工艺参数对铸铝合金化学镀镍磷防护质量的影响
研究了温度、pH和时间变化对铸造铝合金(CAA)衬底化学镀镍(EN)保护量和质量的影响。在酸碱液中,基底的表面条件保持不变,而温度、pH值和电镀时间则发生变化。在溶液pH为5.0 ~ 5.5范围内,酸性溶液pH为5.2时质量最佳。在较低的pH值(5.0-5.1)下,EN沉积具有良好的附着力。在镀液pH为7.0 ~ 11.5的范围内,溶液pH为10.5时,CAA基底上EN沉积的数量和质量最高。其特点是气孔少,金属EN膜不连续。EN沉积的数量与时间有关,而附着力和亮度则不受时间控制。根据实验结果数据的变化趋势,建立了最佳拟合模型。采用Jeol JSM-7600F场发射扫描电镜对涂层的表面形貌和化学成分进行了研究。
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