Skeletal rearrangements of siliconium ions in the gas phase: mass spectra of some phenoxasilins

I. Lengyel, M. Aaronson
{"title":"Skeletal rearrangements of siliconium ions in the gas phase: mass spectra of some phenoxasilins","authors":"I. Lengyel, M. Aaronson","doi":"10.1039/J29710000177","DOIUrl":null,"url":null,"abstract":"The molecular ions of both 10,10-dimethyl-(Ia) and 10,10-diphenyl-phenoxasilin (Ib) undergo consecutive elimination of the two substituents from position 10, followed by ejection of SiO from the centre ring. The (M– R)+ species in (Ia) fragments by competitive expulsion of CH2O, SiH2O, and SiHO·, which involves complex molecular reorganizations. An abundant m/e 91 (C7H7) peak, generated through C(alkyl)–C(aryl) bond formation, is noted. The unique extrusion of the oxygen bridge in conjunction with two aromatic hydrogen atoms (H2O) from the (M– R)+ peak in (Ib) leads to an abundant even-electron siliconium ion at m/e 255. The expulsion of SiHO· from the (M– R)+ species is also observed in compound (Ib). The elements of dibenzofuran are lost from the molecular ion to give divalent siliconium ions SiR2˙+ in both compounds (Ia) and (Ib).","PeriodicalId":17268,"journal":{"name":"Journal of The Chemical Society B: Physical Organic","volume":"55 2 1","pages":"177-181"},"PeriodicalIF":0.0000,"publicationDate":"1971-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"3","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Journal of The Chemical Society B: Physical Organic","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1039/J29710000177","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 3

Abstract

The molecular ions of both 10,10-dimethyl-(Ia) and 10,10-diphenyl-phenoxasilin (Ib) undergo consecutive elimination of the two substituents from position 10, followed by ejection of SiO from the centre ring. The (M– R)+ species in (Ia) fragments by competitive expulsion of CH2O, SiH2O, and SiHO·, which involves complex molecular reorganizations. An abundant m/e 91 (C7H7) peak, generated through C(alkyl)–C(aryl) bond formation, is noted. The unique extrusion of the oxygen bridge in conjunction with two aromatic hydrogen atoms (H2O) from the (M– R)+ peak in (Ib) leads to an abundant even-electron siliconium ion at m/e 255. The expulsion of SiHO· from the (M– R)+ species is also observed in compound (Ib). The elements of dibenzofuran are lost from the molecular ion to give divalent siliconium ions SiR2˙+ in both compounds (Ia) and (Ib).
查看原文
分享 分享
微信好友 朋友圈 QQ好友 复制链接
本刊更多论文
气相中硅离子的骨架重排:一些苯恶西林的质谱
10,10-二甲基-(Ia)和10,10-二苯基-苯氧西林(Ib)的分子离子在10位上连续消去两个取代基,然后从中心环上喷射出SiO。(Ia)片段中的(M - R)+物质通过CH2O、SiH2O和SiHO·的竞争性排出,涉及复杂的分子重组。在C(烷基)-C(芳基)键形成过程中产生了丰富的m/e 91 (C7H7)峰。氧桥与两个芳香氢原子(H2O)在(Ib)中的(M - R)+峰上的独特挤压导致在M /e 255处有丰富的偶电子硅离子。在化合物(Ib)中也观察到SiHO·从(M - R)+物质中被排出。在化合物(Ia)和(Ib)中,二苯并呋喃的元素从分子离子中丢失,形成二价硅离子SiR2˙+。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 去求助
来源期刊
自引率
0.00%
发文量
0
期刊最新文献
Kinetics and mechanism of electrophilic substitution of heteroaromatic compounds. Part XXIII. Acid-catalysed hydrogen exchange of quinoline, isoquinoline, and their N-oxides Dielectric relaxation and dipole moments of substituted pyrroles Free-radical addition to olefins. Part VII. Addition of trichloromethyl radicals to chloro-olefins Primary hydrogen isotope effects on the rate of ionization of nitroethane in mixtures of water and dimethyl sulphoxide The conformational analysis of saturated heterocycles. Part XXXV. 1-Phenoxymethyl-3,4-dihydroisoquinolines
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
现在去查看 取消
×
提示
确定
0
微信
客服QQ
Book学术公众号 扫码关注我们
反馈
×
意见反馈
请填写您的意见或建议
请填写您的手机或邮箱
已复制链接
已复制链接
快去分享给好友吧!
我知道了
×
扫码分享
扫码分享
Book学术官方微信
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术
文献互助 智能选刊 最新文献 互助须知 联系我们:info@booksci.cn
Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。
Copyright © 2023 Book学术 All rights reserved.
ghs 京公网安备 11010802042870号 京ICP备2023020795号-1