High Performance Chip-Partitioned Millimeter Wave Passive Devices on Smooth and Fine Pitch InFO RDL

Che-Wei Hsu, C. Tsai, J. Hsieh, K. Yee, Chuei-Tang Wang, Douglas Yu
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引用次数: 15

Abstract

High performance millimeter wave passive devices are realized on smooth, fine pitch InFO redistribution layer (RDL). These passive devices are balun, power combiner, coupler, and microstrip line and the electrical performances are measured from 0.1GHz to 67 GHz through VNA. The measurement results show that the transmission loss of on-InFO balun (4.3 dB), the power divider (4.3 dB), and the coupler (4.9 dB) outperforms on-chip one by 2.1 dB, 1 dB, and 0.2 dB, respectively. While the transmission loss of microstrip line (0.34 dB/mm) is better than on-chip one by 0.17 dB/mm at 60 GHz. Furthermore, the parasitic of InFO chip-package interconnection has been investigated and compared to other technologies with and without solder bumps. The parasitic resistance, inductance, and capacitance for InFO interconnection are 75 %, 76 %, and 14 % lower than those for chip-last, face-down technology. Parasitic resistance for InFO RDL is 10 % lower than that for chip-first face-down technology with uneven RDL.
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基于平滑和细间距的高性能芯片分块毫米波无源器件
高性能毫米波无源器件是在光滑、细间距信息重分布层(RDL)上实现的。这些无源器件包括平衡器、功率合流器、耦合器和微带线,通过VNA在0.1GHz至67 GHz范围内测量电性能。测量结果表明,on-InFO平衡器(4.3 dB)、功率分配器(4.3 dB)和耦合器(4.9 dB)的传输损耗分别比片上平衡器高2.1 dB、1 dB和0.2 dB。60 GHz时微带线的传输损耗(0.34 dB/mm)比片上线的传输损耗低0.17 dB/mm。此外,还研究了InFO芯片封装互连的寄生性,并与其他有和没有焊点的技术进行了比较。InFO互连的寄生电阻、电感和电容分别比末片、面朝下互连低75%、76%和14%。InFO RDL的寄生电阻比不均匀RDL的芯片优先面朝下技术低10%。
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