Diffusion activation energy of cadmium in thin film CuInGaSe2

N. Biderman, S. Novak, T. Laursen, R. Matyi, R. Sundaramoorthy, Gary Dufresne, J. Wax, M. Gardner, D. Fobare, D. Metacarpa, P. Haldar, J. Lloyd
{"title":"Diffusion activation energy of cadmium in thin film CuInGaSe2","authors":"N. Biderman, S. Novak, T. Laursen, R. Matyi, R. Sundaramoorthy, Gary Dufresne, J. Wax, M. Gardner, D. Fobare, D. Metacarpa, P. Haldar, J. Lloyd","doi":"10.1109/PVSC.2013.6744499","DOIUrl":null,"url":null,"abstract":"Diffusivity and activation energy of cadmium in copper indium gallium diselenide (CuInGaSe2 or CIGS) thin films were investigated by annealing solar-grade SLG/Mo/CIGS/CdS samples of two different CIGS thicknesses at temperatures between 150° C and 325° C. Diffusion profiles of cadmium volume and grain boundary were investigated by dual-beam time-of-flight secondary ion mass spectroscopy. A relationship between the cadmium's volume and grain boundary diffusion coefficients and their activation energies at a given annealing temperature was established using LeClaire's grain boundary diffusion model. The data also provide evidence that cadmium diffusion may be strongly modulated by a gallium gradient seen both laterally at the interface and in the bulk in solar-grade CIGS material.","PeriodicalId":6350,"journal":{"name":"2013 IEEE 39th Photovoltaic Specialists Conference (PVSC)","volume":"58 1","pages":"1836-1841"},"PeriodicalIF":0.0000,"publicationDate":"2013-06-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"2","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"2013 IEEE 39th Photovoltaic Specialists Conference (PVSC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/PVSC.2013.6744499","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 2

Abstract

Diffusivity and activation energy of cadmium in copper indium gallium diselenide (CuInGaSe2 or CIGS) thin films were investigated by annealing solar-grade SLG/Mo/CIGS/CdS samples of two different CIGS thicknesses at temperatures between 150° C and 325° C. Diffusion profiles of cadmium volume and grain boundary were investigated by dual-beam time-of-flight secondary ion mass spectroscopy. A relationship between the cadmium's volume and grain boundary diffusion coefficients and their activation energies at a given annealing temperature was established using LeClaire's grain boundary diffusion model. The data also provide evidence that cadmium diffusion may be strongly modulated by a gallium gradient seen both laterally at the interface and in the bulk in solar-grade CIGS material.
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镉在CuInGaSe2薄膜中的扩散活化能
采用太阳级SLG/Mo/CIGS/CdS两种不同CIGS厚度的样品,在150℃~ 325℃的温度下退火,研究了镉在铜铟镓二硒化(CuInGaSe2或CIGS)薄膜中的扩散率和活化能,并用双光束飞行时间二次离子质谱研究了镉的体积和晶界扩散谱。利用LeClaire晶界扩散模型建立了给定退火温度下镉的体积与晶界扩散系数及其活化能之间的关系。这些数据还提供了证据,表明镉的扩散可能受到镓梯度的强烈调制,这种梯度在太阳级CIGS材料的界面和大块中都可以看到。
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