Electrical Properties of n-CdSe/Si-p Junction Prepared by Chemical Bath Deposition Technique, from Different Weights of Sodium Selenosulfate and Constant Molarity

Sarah Abdulkaleq, L. A. Al Taan
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引用次数: 1

Abstract

A pn-junction was successfully fabricated by depositing n-type CdSe thin films on p-type Si as a substrate using chemical bath deposition technique (CBD) at 70 o C. Time of deposition was 6 hours and the preparing solution was changed every 2 hours during the deposition. Sodium Selenosulfate (with different weights) is the source of Se -2 ions, cadmium nitrate is the source of Cd +2 ions. The (I-V) characteristics for the n-CdSe/p-Si junction show it behaves as a Zener diode in reverse bias, with Zener resistance (3 and 27×10 3 )  . SEM also shows spherical-shape particles with difference grain size (3.8 and 19.8) nm.
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化学浴沉积法制备n-CdSe/Si-p结的电学性质
采用化学浴沉积技术(CBD)在70℃下将n型CdSe薄膜沉积在p型Si作为衬底上,成功制备了一个pn结,沉积时间为6小时,沉积过程中每2小时更换一次制备溶液。硒化硫酸钠(不同重量)是Se -2离子的来源,硝酸镉是Cd +2离子的来源。n-CdSe/p-Si结的(I-V)特性表明它在反向偏置下表现为齐纳二极管,具有齐纳电阻(3和27×10 3)。扫描电镜还观察到不同粒径(3.8 nm和19.8 nm)的球形颗粒。
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