Exponential absorption edge and implantation-induced modifications in amorphous gallium arsenide

I. D. Desnica-Frankovi
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引用次数: 3

Abstract

Abstract Implantation-induced microstructural modifications have been measured in amorphous GaAs using Raman scattering spectroscopy and optical absorption in the subgap region. Additional evidence is given that the amorphous phase consists of two components which continuously evolve as a function of ion dose. A characteristic disorder-related Urbach parameter from the absorption measurements was used as a measure of the total disorder at each dose, whereas Raman results enabled the separation of a random component (amorphous continuous random network (a-CRN)) and a medium-rangeordered component (amorphous boson peak (a-Br)) of the amorphous network. As the dose is increased, the a-CRN fraction gradually converts into the a-BP fraction. The decrease in the remaining a-CRN fraction with increasing dose correlates with the decrease in the disorder as observed by absorption measurements and the Urbach parameter.
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非晶砷化镓的指数吸收边和注入诱导修饰
摘要利用拉曼散射光谱和亚隙区的光学吸收测量了非晶砷化镓中植入诱导的微观结构修饰。进一步的证据表明,非晶相由两种组分组成,这两种组分随离子剂量的变化而不断演化。来自吸收测量的特征无序相关厄巴赫参数被用作每次剂量下总无序的度量,而拉曼结果使非晶态网络的随机成分(非晶态连续随机网络(A - crn))和中范围有序成分(非晶态玻色子峰(A - br))分离。随着剂量的增加,a-CRN组分逐渐转化为a-BP组分。通过吸收测量和厄巴赫参数观察到,随着剂量的增加,剩余a-CRN分数的减少与紊乱的减少有关。
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