A Review on Metal Impurities in Pharmaceuticals

A. Patel, Avadhi R. Bundheliya, A. Vyas, Nilesh Patel, Ajay I. Patel, Arvind N. Lumbhani
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引用次数: 9

Abstract

Sources of metal impurities can from anywhere in drug product as raw material which may produce using metal catalyst, excipients, process materials, Water or any solvent used, manufacturing equipment, environment, packaging materials. So, it leads to metal impurity in high amount present in final drug product that is why it is important to check the impurity level in final drug product or as well as in process also that it should be present in low or acceptable amount. Any Drug product is not completely pure, some amount of metal impurities are always present in pharmaceutical product may cause various toxicity when it will be administered. Thus it is necessary to check impurity level is present at acceptable amount. The present review gives an account of updated information about metal impurities and reviews the regulatory aspects for such metal impurities in drug substance/drug product. In addition the aim of this article is to discuss the currently used different analytical techniques for detection of metals from drug product like spectrophotometry, X – Ray florescence spectrometry, AAS, INAA, ICP – AES, ICP – MS, MP – AES, Laser Ablation – ICP – MS etc which is used for quality control of metal impurities in pharmaceuticals.
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药物中金属杂质研究进展
金属杂质的来源可以从药品的任何地方作为原料,生产中可能使用金属催化剂、辅料、工艺材料、水或任何溶剂、制造设备、环境、包装材料等。因此,它会导致最终药品中出现大量的金属杂质,这就是为什么检查最终药品中的杂质水平很重要,以及在过程中,它应该以低或可接受的量存在。任何药品都不是完全纯净的,一定数量的金属杂质总是存在于药品中,在给药时可能会引起各种毒性。因此,有必要检查杂质水平是否存在于可接受的量。本综述介绍了金属杂质的最新信息,并综述了原料药/制剂中金属杂质的监管方面。此外,本文还讨论了目前用于药品金属杂质质量控制的各种分析技术,如分光光度法、X射线荧光光谱法、原子吸收分光光度法、原子吸收光谱法、原子吸收光谱法、ICP - AES法、ICP - MS法、MP - AES法、激光烧蚀- ICP - MS法等。
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